SCHEMBL3843216

SCHEMBL3843216

CS(=O)(=O)Oc1ccc(-c2ccc(OS(C)(=O)=O)c(F)c2)cc1F

nearest known ligand 0.47

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 14/20 0.47
PTGS1 P23219 6/20 0.43
KIF11 P52732 2/20 0.41
ERN1 O75460 1/20 0.40
CA12 O43570 2/20 0.38
CA2 P00918 2/20 0.38
CYP17A1 P05093 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3746820 0.84 PTGS2 (0.43) PTGS2PTGS1
SCHEMBL17355693 0.82 CA1 (0.52) PTGS2PTGS1CA2
SCHEMBL8756177 0.81 L3MBTL1 (0.39) PTGS2PTGS1CA2
SCHEMBL16680513 0.81 PPARG (0.46) PTGS2PTGS1
SCHEMBL9957777 0.79 GAA (0.47) PTGS2CA12CA2
SCHEMBL17356322 0.78 CA1 (0.40) KIF11CA2
SCHEMBL3829123 0.78 KDM4E (0.40) PTGS2PTGS1CA2
SCHEMBL3842110 0.78 CA1 (0.44) PTGS2KIF11CA2
SCHEMBL17356481 0.78 MRGPRX4 (0.41) PTGS2CA2
SCHEMBL3859664 0.78 TSHR (0.44) PTGS2PTGS1CA12CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2112133-B1 Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same JSR CORP (JP) 2012-07-04 EP disclosed
EP-2112133-A1 Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same JSR Corporation (JP) 2009-10-28 EP disclosed
EP-1245555-B1 Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same JSR CORP (JP) 2009-08-19 EP disclosed
EP-1482589-B1 Manufacturing process of membrane-electrode assemblies JSR CORP (JP) 2009-02-18 EP disclosed
EP-1245638-B1 Composition for insulating film formation JSR CORP (JP) 2009-01-14 EP disclosed
US-7396607-B2 Manufacturing process for membrane-electrode assemblies JSR CORPORATION (JP) 2008-07-08 US disclosed
EP-1188807-B1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORP (JP) 2007-10-17 EP disclosed
EP-1298176-B1 Stacked film insulating film and substrate for semiconductor JSR CORP (JP) 2007-01-03 EP disclosed
US-7153767-B2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2006-12-26 US disclosed
US-20060269655-A1 Process for producing electrolyte membrane-bonded electrode and varnish composition used therein JSR CORPORATION 2006-11-30 US disclosed
US-20020177656-A1 Monomer containing electron-withdrawing group and electron-donative group, and copolymer and proton-conductive membrane comprising same JSR CORPORATION (JP) 2002-11-28 US disclosed
US-20020172652-A1 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2002-11-21 US disclosed
US-20020172850-A1 Polymer electrolyte membrane and solid polymer electrolyte fuel cell using same HONDA GIKEN KOGYO KABUSHIKI KAISHA, JSR CORPORATION 2002-11-21 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
EP-1245554-A1 Monomer containing electron-withdrawing group and electron-donative group, and copolymer and proton-conductive membrane comprising same JSR Corporation (JP) 2002-10-02 EP disclosed
EP-1245555-A1 Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same JSR Corporation (JP) 2002-10-02 EP disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 EP disclosed
US-20010037000-A1 Polyarylene copolymers and proton-conductive membrane JSR CORPORATION (JP) 2001-11-01 US disclosed
EP-1138712-A2 Polyarylene copolymers and proton-conductive membrane JSR Corporation (JP) 2001-10-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172652-A1 Composition for film formation and material for insulating film formation VCL, BMI1, PUF60 PTGS2 4113/4885PTGS1 4226/4885KIF11 2639/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.