SCHEMBL384355

SCHEMBL384355

CCC1(COCOCOCC2(CC)COC2)COC1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28001078 1.00 TSHR (0.33) TSHREPHX1
SCHEMBL12394593 0.98 TSHR (0.34) TSHREPHX1
SCHEMBL10071386 0.92 TSHR (0.31) TSHR
SCHEMBL10071385 0.92 TSHR (0.31) TSHR
SCHEMBL10071382 0.92 TSHR (0.31) TSHR
SCHEMBL21396944 0.91 TSHR (0.32) TSHR
SCHEMBL17133610 0.90 EPHX1 (0.39) TSHREPHX1
SCHEMBL439901 0.88 TSHR (0.36) TSHREPHX1
SCHEMBL28041974 0.88 TSHR (0.31) TSHR
SCHEMBL10071384 0.87 TSHR (0.32) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 435 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN claimed
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN disclosed
US-12443101-B2 Cured coating film TAIYO HOLDINGS CO., LTD. (JP) 2025-10-14 US disclosed
US-20250297048-A1 (METH)ACRYLATE-BASED RESIN, AND DRY FILM SOLDER RESIST COMPRISING SAME LG CHEM, LTD. (KR) 2025-09-25 US disclosed
US-20250277073-A1 CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE FUJIFILM CORPORATION (JP) 2025-09-04 US disclosed
EP-3778805-B1 CURABLE COMPOSITION FOR INKJET, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT COMPRISING SAID CURED PRODUCT TAIYO HOLDINGS CO LTD (JP) 2025-09-03 EP disclosed
EP-3778793-B1 CURABLE COMPOSITION FOR INKJET PRINTING, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT HAVING THE CURED PRODUCT TAIYO HOLDINGS CO LTD (JP) 2025-08-27 EP disclosed
US-12313973-B2 Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same LG CHEM, LTD. (KR) 2025-05-27 US disclosed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN disclosed
CN-115135496-B Structure body 太阳控股株式会社 2025-04-15 CN disclosed
EP-1780599-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION FUJIFILM Corporation (JP) 2007-05-02 EP disclosed
CN-1945434-A Photohardenable and thermosetting resin compositions, their hardened product, and printing circuit boards using the same TAIYO INK MFG CO LTD (JP) 2007-04-11 CN disclosed
EP-1251118-B1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY UNIV KANAGAWA (JP) 2006-12-20 EP disclosed
US-7057063-B2 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2006-06-06 US disclosed
US-20060030636-A1 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY 2006-02-09 US disclosed
WO-2006004171-A1 PHOTOSENSITIVE FILM, PROCESS FOR PRODUCING THE SAME, PROCESS FOR FORMING PERMANENT PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2006-01-12 WO disclosed
WO-2005093793-A1 PROCESS FOR FORMING PERMANENT PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2005-10-06 WO disclosed
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2003-01-09 US disclosed
EP-1251118-A1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY Kanagawa University (JP) 2002-10-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12313973-B2 Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same MMAB, BMI1, EZH2 TSHR 3730/4885EPHX1 2808/4885
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL4 TSHR 4262/4885EPHX1 1917/4885
US-20060030636-A1 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL3 TSHR 3538/4885EPHX1 828/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.