Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | ALPL | P05186 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | HTR6 | P50406 | 4/20 | 0.36 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.36 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | ESR1 | P03372 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9957659 | 0.92 | KMT2A (0.44) | KMT2AKDM4EMAPTMAPK1L3MBTL1 | |
| SCHEMBL6938262 | 0.89 | MAPT (0.48) | KMT2AKDM4EMAPTMAPK1L3MBTL1 | |
| SCHEMBL29497718 | 0.89 | MAPT (0.48) | KMT2AKDM4EMAPTMAPK1L3MBTL1 | |
| SCHEMBL19275104 | 0.86 | EPAS1 (0.43) | KMT2AKDM4EMAPTALPLHTR6 | |
| SCHEMBL14873026 | 0.86 | TSHR (0.48) | KMT2AKDM4EMAPTTDP1CYP1A2 | |
| SCHEMBL28030773 | 0.86 | KMT2A (0.44) | KMT2AKDM4EMAPTMAPK1TSHR | |
| SCHEMBL29497737 | 0.85 | KDM4E (0.56) | KMT2AKDM4ECYP1A2ALPLTSHR | |
| SCHEMBL20582860 | 0.85 | KDM4E (0.56) | KMT2AKDM4ECYP1A2ALPLTSHR | |
| SCHEMBL19365952 | 0.84 | KDM4E (0.45) | KMT2AKDM4EMAPTMAPK1L3MBTL1 | |
| SCHEMBL3839152 | 0.82 | NFE2L2 (0.42) | KMT2AKDM4EL3MBTL1HTR6KEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2112133-B1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR CORP (JP) | 2012-07-04 | — | — | EP | disclosed |
| EP-2112133-A1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR Corporation (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-1245555-B1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1482589-B1 | Manufacturing process of membrane-electrode assemblies | JSR CORP (JP) | 2009-02-18 | — | — | EP | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-7396607-B2 | Manufacturing process for membrane-electrode assemblies | JSR CORPORATION (JP) | 2008-07-08 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1245555-A1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1245554-A1 | Monomer containing electron-withdrawing group and electron-donative group, and copolymer and proton-conductive membrane comprising same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| US-20010037000-A1 | Polyarylene copolymers and proton-conductive membrane | JSR CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-0956312-B1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR CORP (JP) | 2001-10-10 | — | — | EP | disclosed |
| US-6300465-B1 | Process for producing phenylene-containing polymer and film-forming material | JSR CORPORATION (JP) | 2001-10-09 | — | — | US | disclosed |
| EP-1138712-A2 | Polyarylene copolymers and proton-conductive membrane | JSR Corporation (JP) | 2001-10-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | VCL, BMI1, PUF60 | KMT2A 614/4885KDM4E 318/4885MAPT 649/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.