Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8026331 | 0.78 | HIF1A (0.33) | — | |
| SCHEMBL7857422 | 0.76 | HTR2C (0.30) | — | |
| SCHEMBL31186268 | 0.76 | KDM4E (0.34) | — | |
| SCHEMBL7978352 | 0.72 | — | — | |
| SCHEMBL8772649 | 0.69 | KDM1A (0.31) | — | |
| SCHEMBL9485242 | 0.68 | KDM1A (0.30) | — | |
| SCHEMBL8031290 | 0.66 | TDP2 (0.36) | — | |
| SCHEMBL2965930 | 0.65 | TRPA1 (0.37) | CA1CA2CA9 | |
| SCHEMBL11845217 | 0.63 | CA1 (0.37) | CA1CA2CA4CA7CA9 | |
| SCHEMBL6544873 | 0.63 | ADAMTS4 (0.31) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0934240-B1 | PRODUCTION OF 6-BROMO-2-NAPHTHOL AND DERIVATIVES | ALBEMARLE CORP (US) | 2001-01-10 | — | — | EP | claimed |
| EP-4668315-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM FOR SEMICONDUCTOR CHIP MANUFACTURE, SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR CHIP, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | Nissan Chemical Corporation (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250361419-A1 | COMPOSITION FOR FORMING COATING FILM FOR REMOVING FOREIGN MATTERS AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-4629280-A1 | COMPOSITION FOR FORMING COATING FILM FOR FOREIGN SUBSTANCE REMOVAL, AND SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2025-10-08 | — | — | EP | disclosed |
| CN-119404289-A | Composition for forming coating film for removing foreign matter and semiconductor substrate | 日产化学株式会社 | 2025-02-07 | — | — | CN | disclosed |
| WO-2024172010-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM FOR SEMICONDUCTOR CHIP MANUFACTURE, SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR CHIP, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | 日産化学株式会社 | 2024-08-22 | — | — | WO | disclosed |
| WO-2024117235-A1 | COMPOSITION FOR FORMING COATING FILM FOR FOREIGN SUBSTANCE REMOVAL, AND SEMICONDUCTOR SUBSTRATE | 日産化学株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2023248946-A1 | COMPOSITION FOR FORMING COATING FILM FOR FOREIGN SUBSTANCE REMOVAL, AND SEMICONDUCTOR SUBSTRATE | 日産化学株式会社 | 2023-12-28 | — | — | WO | disclosed |
| CN-110366768-B | Composition for forming coating film for removing foreign matter | 日产化学株式会社 | 2023-09-26 | — | — | CN | disclosed |
| US-20230250314-A1 | COMPOSITION FOR FORMING A COATING FILM FOR REMOVING FOREIGN MATTERS | NISSAN CHEMICAL CORPORATION (JP) | 2023-08-10 | — | — | US | disclosed |
| US-8916327-B2 | Underlayer coating forming composition containing dextrin ester compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-23 | — | — | US | disclosed |
| EP-1666972-B1 | USE OF A COMPOSITION CONTAINING POLYAMIC ACID FOR FORMING AN ANTI-REFLECTIVE COATING | NISSAN CHEMICAL IND LTD (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-7598182-B2 | having monomers of pyromellitic acid, 3,5-diaminobenzoic acid; use in a lithography for forming photoresist pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| EP-1681594-B1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2009-05-13 | — | — | EP | disclosed |
| US-20070135581-A1 | Underlayer coating forming composition containing dextrin ester compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070004228-A1 | Polyamide acid-containing composition for forming antireflective film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| EP-1681594-A1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |
| EP-1666972-A1 | POLYAMIDE ACID-CONTAINING COMPOSITION FOR FORMING ANTIREFLECTIVE FILM | Nissan Chemical Industries, Ltd. (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-4374262-A | Preparation of hydroxy aromatic carboxylic acids and ester derivatives thereof | CELANESE CORPORATION (US) | 1983-02-15 | — | — | US | disclosed |
| EP-0049616-A1 | Preparation of hydroxy aromatic carboxylic acids and ester derivatives thereof | CELANESE CORPORATION (US) | 1982-04-14 | — | — | EP | disclosed |