SCHEMBL38659502

SCHEMBL38659502

O=S(=O)(O)c1sc(-c2ccccc2)c(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.42
TSHR P16473 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
PTGS2 P35354 3/20 0.38
GRM6 O15303 1/20 0.37
MAPT P10636 3/20 0.35
LMNA P02545 2/20 0.35
HTT P42858 1/20 0.35
KDM4E B2RXH2 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
ALOX5 P09917 1/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
GAA P10253 1/20 0.33
KMT2A Q03164 1/20 0.33
TP53 P04637 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL8752125 0.76 MAPT (0.48) L3MBTL1SMN1; SMN2PTGS2GRM6MAPT
SCHEMBL4761700 0.75 SMN1; SMN2 (0.36) TSHRSMN1; SMN2MAPTLMNAKDM4E
SCHEMBL1224397 0.75 MAPT (0.56) L3MBTL1PTGS2GRM6MAPTLMNA
SCHEMBL28123162 0.67 MAPT (0.48) L3MBTL1PTGS2GRM6MAPTLMNA
SCHEMBL28304213 0.66 MAPT (0.42) L3MBTL1PTGS2GRM6MAPTLMNA
SCHEMBL4625921 0.66 MAPT (0.41) L3MBTL1PTGS2GRM6MAPTLMNA
SCHEMBL9364153 0.66 CYP3A4 (0.61) L3MBTL1TSHRSMN1; SMN2PTGS2GRM6
Sulfuric Acid SCHEMBL28507654 0.66 HNF4A (0.48) TSHRSMN1; SMN2PTGS2MAPTLMNA
SCHEMBL8582553 0.66 CYP3A4 (0.61) L3MBTL1TSHRSMN1; SMN2PTGS2GRM6
SCHEMBL10109209 0.66 ALOX5 (0.42) L3MBTL1SMN1; SMN2PTGS2GRM6MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120349290-B Resist, preparation method, composition, adhesive layer and pattern forming method 南开大学 2026-05-19 CN disclosed