Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 6/20 | 0.35 |
| ▸ | FAAH | O00519 | 1/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL701766 | 0.92 | EPHX2 (0.31) | EPHX2KMT2A | |
| SCHEMBL1482224 | 0.86 | THRB (0.31) | KMT2A | |
| SCHEMBL701564 | 0.86 | THRB (0.31) | KMT2A | |
| SCHEMBL14798101 | 0.82 | THRB (0.32) | — | |
| SCHEMBL701492 | 0.75 | THRB (0.33) | — | |
| SCHEMBL2832305 | 0.75 | THRB (0.33) | — | |
| SCHEMBL6744611 | 0.75 | THRB (0.33) | — | |
| SCHEMBL14801409 | 0.75 | THRB (0.33) | — | |
| SCHEMBL14973388 | 0.74 | EPHX2 (0.40) | EPHX2FAAHKMT2A | |
| SCHEMBL6559871 | 0.73 | THRB (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2016464-B1 | NEGATIVE PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2021-04-28 | — | — | EP | disclosed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | disclosed |
| EP-3394674-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-05-06 | — | — | EP | disclosed |
| EP-3511774-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2019-07-17 | — | — | EP | disclosed |
| EP-3394674-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2018-10-31 | — | — | EP | disclosed |
| US-20170285475-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOF | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2017-10-05 | — | — | US | disclosed |
| US-20170176856-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOF | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-06-22 | — | — | US | disclosed |
| US-7601482-B2 | Negative photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | disclosed |
| EP-2016464-A2 | NEGATIVE PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2009-01-21 | — | — | EP | disclosed |
| WO-2007110773-A2 | NEGATIVE PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-10-04 | — | — | WO | disclosed |
| US-20070231735-A1 | Negative photoresist compositions | MERCK PATENT GMBH (DE) | 2007-10-04 | — | — | US | disclosed |