SCHEMBL387076

SCHEMBL387076

C=CC[Si](Cl)(Cl)CCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28492917 0.80 TSHR (0.36)
SCHEMBL20473670 0.78 TSHR (0.37)
SCHEMBL28819146 0.78
SCHEMBL28015912 0.78 ALDH1A1 (0.30)
SCHEMBL6063886 0.78 TSHR (0.40)
SCHEMBL758165 0.77 ALDH1A1 (0.30)
SCHEMBL20473659 0.76 TSHR (0.41)
SCHEMBL28483750 0.76 TSHR (0.41)
SCHEMBL2491733 0.76 TSHR (0.41)
SCHEMBL3101030 0.75 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025043983-A1 LOW-TEMPERATURE AND HIGH-HUMIDITY RESISTANT PRIMER FOR SILICONE SEALANT, AND PREPARATION METHOD THEREFOR 广州白云科技股份有限公司 2025-03-06 WO claimed
CN-117105970-A Low-temperature-resistant high-humidity-resistant primer for silicone sealant and preparation method thereof 广州白云科技股份有限公司 2023-11-24 CN claimed
US-20220363929-A1 INKJET INK COMPOSITION HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2022-11-17 US claimed
WO-2021112819-A1 INKJET INK COMPOSITION HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-06-10 WO claimed
CN-108235707-A Asphalt modifier and the bituminous composition comprising the asphalt modifier LG化学株式会社 2018-06-29 CN claimed
EP-2276793-B1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS ESSILOR INT (FR) 2012-08-01 EP claimed
EP-2470574-A2 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION Bridgestone Corporation (JP) 2012-07-04 EP claimed
US-20120165484-A1 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION BRIDGESTONE CORPORATION (JP) 2012-06-28 US claimed
US-8101697-B2 Multi-functionalized high-trans elastomeric polymers BRIDGESTONE CORPORATION (JP) 2012-01-24 US claimed
US-8063237-B2 Sulfur modified silanes for the elaboration of high refractive index materials ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2011-11-22 US claimed
US-20110077341-A1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS ESSILOR INTERNATIONAL (FR) 2011-03-31 US claimed
WO-2011028523-A2 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION BRIDGESTONE CORPORATION (JP) 2011-03-10 WO claimed
EP-2276793-A1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS Essilor International (Compagnie Générale d'Optique) (FR) 2011-01-26 EP claimed
WO-2009138853-A1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS ESSILOR INTERNATIONAL (FR) 2009-11-19 WO claimed
US-20060173145-A1 Multi-functionalized high-trans elastomeric polymers BRIDGESTONE CORPORATION (JP) 2006-08-03 US claimed
CN-117105970-B Low-temperature-resistant high-humidity-resistant primer for silicone sealant and preparation method thereof 广州白云科技股份有限公司 2025-08-15 CN disclosed
WO-2025043983-A1 LOW-TEMPERATURE AND HIGH-HUMIDITY RESISTANT PRIMER FOR SILICONE SEALANT, AND PREPARATION METHOD THEREFOR 广州白云科技股份有限公司 2025-03-06 WO disclosed
US-5436360-A Cyclic polymers for friction resistance KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1995-07-25 US disclosed
US-5420323-A Hydrosilation KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1995-05-30 US disclosed
EP-0650973-A1 Racemic metallocene complexes and method for their preparation BASF Aktiengesellschaft (DE) 1995-05-03 EP disclosed