Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ATP4AATP4BAXLBTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CHRM2CHRM3CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4FLT3HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3KCNH2KMT2AMAP2K1MAP2K2MEN1MLNRMPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PLK4PPARGRENS1PR1SLC6A2SLC6A3SLC6A4SMOTYK2atpAatpBatpCatpDatpEatpFatpFHatpGpol
The experimentally established mechanism targets of Fumaric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.43 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.43 |
| ▸ | HCAR2 | Q8TDS4 | 6/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.35 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.35 |
| ▸ | PPARA | Q07869 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fumaric Acid SCHEMBL7518280 | 1.00 | TSHR (0.43) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL8953192 | 1.00 | TSHR (0.43) | TSHRTP53EGLN1EGLN3HCAR2 | |
| SCHEMBL17819 | 0.90 | — | — | |
| SCHEMBL17817 | 0.90 | — | — | |
| SCHEMBL5716965 | 0.90 | — | — | |
| Oxalic Acid SCHEMBL7522641 | 0.87 | GRIK2 (0.39) | ALDH1A1ALOX15TDP1PTGS1GRIK1 | |
| SCHEMBL1401918 | 0.87 | GRIK2 (0.39) | ALDH1A1TDP1PTGS1GRIK1GRIK2 | |
| Hydrochloric Acid SCHEMBL2564983 | 0.87 | — | — | |
| Bromide SCHEMBL9604104 | 0.87 | — | — | |
| Oxalic Acid SCHEMBL7522649 | 0.87 | GRIK2 (0.39) | ALDH1A1ALOX15TDP1PTGS1GRIK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2809688-A1 | LASER ENGRAVEABLE COMPOSITIONS FOR RELIEF IMAGE PRINTING ELEMENTS | NAPP SYSTEMS, INC. (US) | 2014-12-10 | — | — | EP | disclosed |
| WO-2013116011-A1 | LASER ENGRAVEABLE COMPOSITIONS FOR RELIEF IMAGE PRINTING ELEMENTS | NAPP SYSTEMS, INC. (US) | 2013-08-08 | — | — | WO | disclosed |
| US-20130196144-A1 | Laser Engraveable Compositions for Relief Image Printing Elements | NAPP SYSTEMS, INC. | 2013-08-01 | — | — | US | disclosed |
| US-7625959-B2 | Curable jettable liquid for flexography | AGFA GRAPHICS, N.V. (BE) | 2009-12-01 | — | — | US | disclosed |
| EP-1637322-B1 | Method for manufacturing a flexographic printing master | AGFA GRAPHICS NV (BE) | 2009-05-13 | — | — | EP | disclosed |
| EP-1637926-B1 | Curable jettable liquid for the production of a flexographic printing plate | AGFA GRAPHICS NV (BE) | 2009-04-22 | — | — | EP | disclosed |
| US-7401552-B2 | Method for manufacturing a flexographic printing master | AGFA GRAPHICS N.V. (BE) | 2008-07-22 | — | — | US | disclosed |
| US-20060073417-A1 | Photopolymer plate and method for imaging the surface of a photopolymer plate | HERMESDORF MARK | 2006-04-06 | — | — | US | disclosed |
| EP-1637926-A2 | Curable jettable liquid for the production of a flexographic printing plate | Agfa-Gevaert (BE) | 2006-03-22 | — | — | EP | disclosed |
| EP-1637322-A2 | Method for manufacturing a flexographic printing master | Agfa-Gevaert (BE) | 2006-03-22 | — | — | EP | disclosed |
| US-5021321-A | Photothermography; antifogging agents; contrast; lamination of matrix of silver salts and reducing agent and dispersed particles of dye, polymer precursor and photoinitiator | CANON KABUSHIKI KAISHA (JP) | 1991-06-04 | — | — | US | disclosed |
| US-5001032-A | Photosensitive material containing a photosensitive and heat developable element and a polymerizable layer and image-forming method utilizing the same | CANON KABUSHIKI KAISHA (JP) | 1991-03-19 | — | — | US | disclosed |
| EP-0412851-A2 | Photosensitive member and multi-color image forming method | CANON KABUSHIKI KAISHA (JP) | 1991-02-13 | — | — | EP | disclosed |
| EP-0410803-A2 | Image forming device | CANON KABUSHIKI KAISHA (JP) | 1991-01-30 | — | — | EP | disclosed |
| EP-0363790-A2 | Image forming method and image forming medium | CANON KABUSHIKI KAISHA (JP) | 1990-04-18 | — | — | EP | disclosed |
| EP-0360014-A1 | Photosensitive material and image forming method using same | CANON KABUSHIKI KAISHA (JP) | 1990-03-28 | — | — | EP | disclosed |
| EP-0332455-A2 | Photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-09-13 | — | — | EP | disclosed |
| EP-0330504-A2 | Photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-08-30 | — | — | EP | disclosed |
| EP-0328364-A2 | Photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1989-08-16 | — | — | EP | disclosed |
| EP-0326424-A2 | Photosensitive composition, photosensitive material, and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-08-02 | — | — | EP | disclosed |