SCHEMBL3876333

SCHEMBL3876333

CC(=CC12CC3CC(C1)CC(C(=O)O)(C3)C2)C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.47
PKM P14618 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
GAA P10253 2/20 0.38
KMT2A Q03164 2/20 0.35
THRB P10828 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
LMNA P02545 1/20 0.33
RBP4 P02753 1/20 0.33
MEN1 O00255 1/20 0.33
GLA P06280 1/20 0.33
NPSR1 Q6W5P4 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3680657 0.88 ALDH1A1 (0.35) ALDH1A1PKML3MBTL1GAAKMT2A
SCHEMBL3680655 0.88 ALDH1A1 (0.35) ALDH1A1PKML3MBTL1GAAKMT2A
SCHEMBL6368717 0.85 ALDH1A1 (0.35) ALDH1A1PKML3MBTL1
SCHEMBL6365048 0.85 GLA (0.39) ALDH1A1L3MBTL1KMT2ATHRBMEN1
SCHEMBL906381 0.82 PKM (0.38) ALDH1A1PKML3MBTL1GAA
SCHEMBL565526 0.82 PKM (0.38) ALDH1A1PKML3MBTL1GAA
SCHEMBL15152944 0.82 TSHR (0.41) ALDH1A1GAATHRB
SCHEMBL757168 0.81 THRB (0.39) ALDH1A1THRBSMN1; SMN2GLA
SCHEMBL157720 0.81 THRB (0.39) ALDH1A1THRBSMN1; SMN2GLA
SCHEMBL5935964 0.79 MEN1 (0.39) ALDH1A1GAAKMT2ASMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8980529-B2 Radiation-sensitive resin composition, polymer, and resist pattern-forming method JSR CORPORATION (JP) 2015-03-17 US disclosed
US-20130203000-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2013-08-08 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1586594-A1 ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-10-19 EP disclosed