Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.36 |
| ▸ | DPP4 | P27487 | 5/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | FAP | Q12884 | 1/20 | 0.31 |
| ▸ | PITRM1 | Q5JRX3 | 1/20 | 0.31 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.31 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.31 |
| ▸ | DPP7 | Q9UHL4 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL565526 | 1.00 | PKM (0.38) | PKMHSD11B1DPP4ALDH1A1FAP | |
| SCHEMBL3680657 | 0.90 | ALDH1A1 (0.35) | PKMALDH1A1L3MBTL1GAA | |
| SCHEMBL3680655 | 0.90 | ALDH1A1 (0.35) | PKMALDH1A1L3MBTL1GAA | |
| SCHEMBL1055411 | 0.85 | DPP4 (0.31) | DPP4 | |
| SCHEMBL564541 | 0.85 | DPP4 (0.31) | DPP4 | |
| SCHEMBL701445 | 0.84 | PKM (0.36) | PKMHSD11B1DPP4ALDH1A1NPC1 | |
| SCHEMBL30898007 | 0.83 | — | — | |
| SCHEMBL15152944 | 0.83 | TSHR (0.41) | ALDH1A1GAA | |
| SCHEMBL757168 | 0.82 | THRB (0.39) | HSD11B1ALDH1A1NPC1 | |
| SCHEMBL157720 | 0.82 | THRB (0.39) | HSD11B1ALDH1A1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| EP-2742385-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | International Business Machines Corporation (US) | 2014-06-18 | — | — | EP | claimed |
| US-8715907-B2 | Developable bottom antireflective coating compositions for negative resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | claimed |
| US-20130040238-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | US | claimed |
| WO-2013023124-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | WO | claimed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-11992538-B2 | Polymerizable dental composition based on condensed silanes | VOCO GMBH (DE) | 2024-05-28 | — | — | US | disclosed |
| CN-109843853-B | Composition and method for manufacturing device using the same | 东洋合成工业株式会社 | 2022-09-20 | — | — | CN | disclosed |
| US-11142495-B2 | Composition and method for manufacturing device using same | TOYO GOSEI CO., LTD. (JP) | 2021-10-12 | — | — | US | disclosed |
| US-6639084-B2 | Comprises vinyl polymer having 3-oxo-4-oxabicyclo(3.2.1) octane-2-yl group; sensitive to far-ultraviolet light; imaging; for use with semiconductor wafers; improved resistance against dry etching and adhesion to substrates | NEC CORPORATION (JP) | 2003-10-28 | — | — | US | disclosed |
| US-6627381-B1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-05-22 | — | — | US | disclosed |
| US-6537726-B2 | Polymeric unit derived from 3-hydroxy-1-adamantyl(meth)acrylate and polymeric unit derived from beta-(meth)acryloyloxy-gamma-butyrolactone; adhesion, sensitivity, resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-25 | — | — | US | disclosed |
| US-20030039918-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-02-27 | — | — | US | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11992538-B2 | Polymerizable dental composition based on condensed silanes | NCAPH, RCC1, NCAPD2 | PKM 3580/4885HSD11B1 2212/4885DPP4 4776/4885 |
| US-11142495-B2 | Composition and method for manufacturing device using same | LBR, LMTK2, MMS19 | PKM 4497/4885HSD11B1 3387/4885DPP4 4790/4885 |
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, OXGR1, ITGA1 | PKM 4171/4885HSD11B1 2866/4885DPP4 4736/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.