Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL3876850

CCCCOc1c(C)cc([S+]2CCCC2)cc1C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.34

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 8/20 0.34
ACHE P22303 4/20 0.33
THRA P10827 1/20 0.33
THRB P10828 1/20 0.33
TSHR P16473 2/20 0.32
MAPK1 P28482 1/20 0.32
RECQL P46063 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PTGS1 P23219 1/20 0.32
PTGS2 P35354 1/20 0.32
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
FFAR4 Q5NUL3 1/20 0.30
S1PR2 O95136 1/20 0.30
S1PR1 P21453 1/20 0.30
S1PR3 Q99500 1/20 0.30
LPAR2 Q9HBW0 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3871480 0.89 TSHR (0.31) TSHRMAPK1RECQLL3MBTL1PTGS1
SCHEMBL3873622 0.88 TSHR (0.31) TSHRMAPK1RECQLL3MBTL1PTGS1
SCHEMBL7158786 0.86 SCN8A (0.35) TSHRMAPK1RECQLL3MBTL1PTGS1
SCHEMBL3872275 0.85 THRA (0.38) THRATHRBTSHRS1PR2S1PR1
SCHEMBL3876688 0.85 THRA (0.33) THRATHRBTSHRMAPK1RECQL
SCHEMBL3871384 0.82 ALDH1A1 (0.40) TSHRMAPK1RECQLL3MBTL1CA12
SCHEMBL3871343 0.81
Trifluoromethanesulfonic Acid SCHEMBL3150414 0.81 CA12 (0.46) KCNH2TSHRMAPK1RECQLL3MBTL1
SCHEMBL3878047 0.80 FAAH (0.32) KCNH2TSHRMAPK1RECQLL3MBTL1
SCHEMBL3874688 0.80 FFAR4 (0.32) TSHRMAPK1RECQLL3MBTL1FFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed