Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | PDIA6 | Q15084 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3874688 | 0.88 | FFAR4 (0.32) | ALDH1A1FFAR4TSHRMAPK1RECQL | |
| SCHEMBL3876688 | 0.82 | THRA (0.33) | TSHRMAPK1RECQLL3MBTL1 | |
| SCHEMBL3873395 | 0.80 | PTGS1 (0.39) | MAPTKCNH2ALDH1A1PTGS1PTGS2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3876850 | 0.80 | KCNH2 (0.34) | KCNH2FFAR4PTGS1PTGS2TSHR | |
| SCHEMBL3871384 | 0.80 | ALDH1A1 (0.40) | TP53KAT6AALDH1A1TSHRMAPK1 | |
| SCHEMBL3872275 | 0.78 | THRA (0.38) | MAPTALDH1A1TSHR | |
| SCHEMBL3872556 | 0.77 | FABP4 (0.40) | FAAHALDH1A1TSHRL3MBTL1 | |
| SCHEMBL3871480 | 0.75 | TSHR (0.31) | PTGS1PTGS2TSHRMAPK1RECQL | |
| SCHEMBL3873622 | 0.74 | TSHR (0.31) | PTGS1PTGS2TSHRMAPK1RECQL | |
| SCHEMBL3878050 | 0.71 | FAAH (0.32) | FAAHMAPTTP53KAT6AKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |