Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.39 |
| ▸ | CASP6 | P55212 | 1/20 | 0.39 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.39 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.39 |
| ▸ | LDHA | P00338 | 1/20 | 0.37 |
| ▸ | IDO1 | P14902 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | DUSP5 | Q16690 | 1/20 | 0.36 |
| ▸ | EP300 | Q09472 | 2/20 | 0.35 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.35 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.35 |
| ▸ | HKDC1 | Q2TB90 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 4/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | G6PD | P11413 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6566223 | 0.91 | EP300 (0.47) | KMT2APOLBAPOBEC3ACASP6CTDSP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL515598 | 0.83 | LDHA (0.37) | KMT2ALDHAIDO1EP300KAT2B | |
| SCHEMBL113203 | 0.83 | IDO1 (0.52) | LDHAIDO1EP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL31168280 | 0.83 | LDHA (0.37) | KMT2ALDHAIDO1EP300KAT2B | |
| SCHEMBL6564827 | 0.83 | MEN1 (0.50) | KMT2APOLBPTPN1DUSP5EP300 | |
| SCHEMBL3870651 | 0.83 | LDHA (0.35) | LDHAIDO1EP300KAT2BKAT8 | |
| Hydrochloric Acid SCHEMBL667919 | 0.82 | IDO1 (0.50) | LDHAIDO1EP300KAT2BKAT8 | |
| SCHEMBL3881541 | 0.78 | LDHA (0.37) | KMT2APOLBLDHAGAAMEN1 | |
| SCHEMBL516312 | 0.77 | CA1 (0.34) | LDHAIDO1EP300KAT2BKAT8 | |
| SCHEMBL515864 | 0.76 | CA1 (0.35) | LDHAIDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |