Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LDHA | P00338 | 1/20 | 0.37 |
| ▸ | IDO1 | P14902 | 4/20 | 0.36 |
| ▸ | GPR3 | P46089 | 1/20 | 0.36 |
| ▸ | CDK2 | P24941 | 1/20 | 0.34 |
| ▸ | EP300 | Q09472 | 3/20 | 0.34 |
| ▸ | KAT2B | Q92831 | 3/20 | 0.34 |
| ▸ | KAT8 | Q9H7Z6 | 3/20 | 0.34 |
| ▸ | PSD | A5PKW4 | 1/20 | 0.33 |
| ▸ | CTSB | P07858 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | ESR1 | P03372 | 2/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.33 |
| ▸ | HKDC1 | Q2TB90 | 2/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.31 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.31 |
| ▸ | MITF | O75030 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31168280 | 1.00 | LDHA (0.37) | LDHAIDO1GPR3CDK2EP300 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566389 | 0.93 | CDK2 (0.38) | LDHAGPR3CDK2GAAMEN1 | |
| SCHEMBL516312 | 0.87 | CA1 (0.34) | LDHAIDO1EP300KAT2BKAT8 | |
| SCHEMBL515864 | 0.86 | CA1 (0.35) | LDHAIDO1 | |
| Trifluoromethanesulfonic Acid SCHEMBL29369242 | 0.85 | PTGS1 (0.35) | ESR1ESR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL5483498 | 0.85 | PTGS1 (0.35) | ESR1ESR2 | |
| SCHEMBL113203 | 0.83 | IDO1 (0.52) | LDHAIDO1EP300KAT2BKAT8 | |
| SCHEMBL3881583 | 0.83 | KMT2A (0.39) | LDHAIDO1EP300KAT2BKAT8 | |
| SCHEMBL3870651 | 0.83 | LDHA (0.35) | LDHAIDO1EP300KAT2BKAT8 | |
| Hydrochloric Acid SCHEMBL667919 | 0.82 | IDO1 (0.50) | LDHAIDO1EP300KAT2BKAT8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11370888-B2 | Silicon-rich silsesquioxane resins | DOW SILICONES CORPORATION (US) | 2022-06-28 | — | — | US | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| CN-109071576-B | Silsesquioxane resin and an oxaamine composition | 美国陶氏有机硅公司 | 2021-12-28 | — | — | CN | disclosed |
| WO-2021106537-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2021-06-03 | — | — | WO | disclosed |
| US-10990012-B2 | Silsesquioxane resin and oxaamine composition | DOW SILICONES CORPORATION (US) | 2021-04-27 | — | — | US | disclosed |
| WO-2020204073-A1 | COMPOSITION FOR CURED-FILM FORMATION, WAVELENGTH CONVERSION FILM, LIGHT-EMITTING DISPLAY ELEMENT, AND METHOD FOR FORMING WAVELENGTH CONVERSION FILM | JSR株式会社 | 2020-10-08 | — | — | WO | disclosed |
| US-20190211155-A1 | SILICON-RICH SILSESQUIOXANE RESINS | DOW SILICONES CORPORATION | 2019-07-11 | — | — | US | disclosed |
| US-20190169436-A1 | SILSESQUIOXANE RESIN AND SILYL-ANHYDRIDE COMPOSITION | DOW SILICONES CORP (US) | 2019-06-06 | — | — | US | disclosed |
| US-20190171106-A1 | Silsesquioxane Resin and Oxaamine Composition | DOW SILICONES CORPORATION | 2019-06-06 | — | — | US | disclosed |
| WO-2017218286-A1 | SILICON-RICH SILSESQUIOXANE RESINS | DOW CORNING CORPORATION (US) | 2017-12-21 | — | — | WO | disclosed |
| US-6242161-B1 | ABSORPTION COATINGS USING COPOLYMERS | JSR CORPORATION (JP) | 2001-06-05 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |