SCHEMBL14593291

SCHEMBL14593291

OC(c1ccc(C(O)(C(F)(F)F)C(F)(F)F)c2ccccc12)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 2/20 0.66
▸ MEN1 O00255 2/20 0.66
▸ MAPT P10636 2/20 0.66
▸ KMT2A Q03164 2/20 0.66
▸ ALDH1A1 P00352 1/20 0.66
▸ GLA P06280 1/20 0.66
▸ POLB P06746 1/20 0.66
▸ GAA P10253 1/20 0.66
▸ HPGD P15428 1/20 0.66
▸ ATM Q13315 1/20 0.66
▸ HSD17B10 Q99714 1/20 0.66
▸ LMNA P02545 1/20 0.62
▸ MAPK1 P28482 1/20 0.62
▸ HTT P42858 1/20 0.62
▸ SMN1; SMN2 Q16637 1/20 0.62
▸ NPSR1 Q6W5P4 1/20 0.62
▸ KCNJ11 Q14654 18/20 0.54
▸ ABCC9 O60706 9/20 0.54
▸ ABCC8 Q09428 9/20 0.54
▸ KCNJ8 Q15842 9/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14593292 0.90 KDM4E (0.57) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL18077903 0.88 KDM4E (0.54) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL16852472 0.88 KDM4E (0.54) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL17711245 0.88 KDM4E (0.54) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL17298377 0.83 KCNJ11 (0.50) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL21028351 0.83 KCNJ11 (0.54) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL3885735 0.82 KDM4E (0.68) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL589730 0.82 HPGD (0.67) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL2582219 0.81 MEN1 (0.52) KDM4EMEN1MAPTKMT2AALDH1A1
SCHEMBL5566472 0.80 KDM4E (1.00) KDM4EMEN1MAPTKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 — — US disclosed
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 — — US disclosed
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