SCHEMBL3890845

SCHEMBL3890845

CCCOCCC[Si](C)(C)OC

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.34
MEN1 O00255 1/20 0.31
THRB P10828 1/20 0.31
HTT P42858 1/20 0.31
KMT2A Q03164 1/20 0.31
MAPT P10636 1/20 0.31
CYP3A4 P08684 1/20 0.30
SPHK2 Q9NRA0 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1615256 0.84 TSHR (0.36) TSHRMEN1THRBHTTKMT2A
SCHEMBL3903651 0.84 ALDH1A1 (0.35) TSHRHTT
SCHEMBL3892681 0.82 TSHR (0.34) TSHRMEN1THRBHTTKMT2A
SCHEMBL19319597 0.82 CA2 (0.31) TSHRCYP3A4
SCHEMBL19319601 0.82 CA2 (0.31) TSHRCYP3A4
SCHEMBL12756084 0.82 CA2 (0.31) TSHRCYP3A4
SCHEMBL804359 0.80 TSHR (0.33) TSHRMEN1THRBHTTKMT2A
SCHEMBL804728 0.80 TSHR (0.38) TSHRMEN1THRBHTTKMT2A
SCHEMBL3903531 0.80 TSHR (0.33) TSHRMEN1THRBHTTKMT2A
SCHEMBL14700556 0.80 TSHR (0.33) TSHRMEN1THRBHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-20170119653-A1 ANTIPERSPIRANT OIL-IN-WATER EMULSIONS HAVING CROSS-LINKED SILICONE POLYMERS HENKEL AG & CO. KGAA (DE) 2017-05-04 US disclosed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-7160659-B2 Electrophotographic apparatus and process cartridge CANON KABUSHIKI KAISHA (JP) 2007-01-09 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170119653-A1 ANTIPERSPIRANT OIL-IN-WATER EMULSIONS HAVING CROSS-LINKED SILICONE POLYMERS CUTA, SOAT1, PHOSPHO1 TSHR 2589/4885MEN1 3056/4885THRB 2405/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.