Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.66 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.51 |
| ▸ | RAD52 | P43351 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
| ▸ | FAAH | O00519 | 2/20 | 0.50 |
| ▸ | DGKA | P23743 | 1/20 | 0.50 |
| ▸ | HTR2C | P28335 | 1/20 | 0.49 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.44 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.44 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.44 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2231096 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL1055187 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL1053266 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL33595 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL9099483 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL9242191 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL9099743 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL1069145 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL749593 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 | |
| SCHEMBL8416064 | 1.00 | NAAA (0.66) | NAAANPSR1RAD52MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-12344758-B2 | Chemical solution-resistant protective film forming composition containing polymerization product having diol structure at terminal thereof | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-01 | — | — | US | disclosed |
| US-20250130498-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION, RESIST PATTERN FORMATION METHOD, FORMATION METHOD FOR RESIST UNDERLAYER FILM PATTERN, AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-04-24 | — | — | US | disclosed |
| US-12221556-B2 | Hard-mask forming composition, method for manufacturing electronic component, and compound and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-02-11 | — | — | US | disclosed |
| US-20240427238-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-12-26 | — | — | US | disclosed |
| US-20240419073-A1 | ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-12-19 | — | — | US | disclosed |
| US-20240393693-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMINATE USING THE COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2024-11-28 | — | — | US | disclosed |
| US-20240295819-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| US-8709978-B2 | Herbicide composition having improved effectiveness, method of preparation and use | AGRO INDUSTRIE RECHERCHES ET DEVELOPPEMENTS (A.R.D.) (FR) | 2014-04-29 | — | — | US | disclosed |
| US-20130035234-A1 | HERBICIDE COMPOSITION HAVING IMPROVED EFFECTIVENESS, METHOD OF PREPARATION AND USE | AGRO INDUSTRIE RECHERCHES ET DEVELOPPEMENTS (A.R.D.) (FR) | 2013-02-07 | — | — | US | disclosed |
| EP-2554049-A1 | Herbicidal composition with improved efficiency, preparation method and use | AGRO INDUSTRIE RECHERCHES ET DEVELOPPEMENTS (A.R.D.) (FR) | 2013-02-06 | — | — | EP | disclosed |
| CN-102754034-A | Composition for formation of resist underlayer film containing silicon having nitrogen-containing ring | NISSAN CHEMICAL IND LTD | 2012-10-24 | — | — | CN | disclosed |
| EP-1315045-B1 | LITHOGRAPHIC GAP-FILLER FORMING COMPOSITION | NISSAN CHEMICAL IND LTD (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-7517633-B2 | Composition for forming gap-filling material for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-04-14 | — | — | US | disclosed |
| US-7378373-B2 | Color former, developer, binder resin, and plasticizer; improved performance | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-05-27 | — | — | US | disclosed |
| US-20070072771-A1 | ERASABLE IMAGE FORMING MATERIAL | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-03-29 | — | — | US | disclosed |
| US-20030146416-A1 | Lithographic gap-filler forming composition | NISSAN CHEMICAL INDUSTRIES LTD (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1315045-A1 | LITHOGRAPHIC GAP-FILLER FORMING COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-05-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130035234-A1 | HERBICIDE COMPOSITION HAVING IMPROVED EFFECTIVENESS, METHOD OF PREPARATION AND USE | DDT, HDHD5, PAOX | NAAA 47/4885NPSR1 2443/4885RAD52 3491/4885 |
| US-12221556-B2 | Hard-mask forming composition, method for manufacturing electronic component, and compound and resin | RER1, SEM1, POP1 | NAAA 4122/4885NPSR1 3501/4885RAD52 781/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.