Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17536213 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL3290453 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL2944909 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL3290634 | 0.96 | ALDH1A1 (0.34) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL2941025 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| Lithium Ion SCHEMBL1005375 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL1785154 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL2157672 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| Carbon Monoxide SCHEMBL3924423 | 0.92 | CA12 (0.30) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL336859 | 0.77 | ALDH1A1 (0.37) | CA12CA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090324827-A1 | CVD FILM FORMING METHOD AND CVD FILM FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2009-12-31 | — | — | US | disclosed |
| US-20090042397-A1 | COPPER RE-DEPOSITION PREVENTING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SUBSTRATE PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2009-02-12 | — | — | US | disclosed |