Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3926609 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL2944909 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL3290453 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL3290634 | 0.96 | ALDH1A1 (0.34) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL17536213 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| Lithium Ion SCHEMBL1005375 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL2941025 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL1785154 | 0.96 | CA12 (0.32) | CA12CA1CA2MMP1MMP2 | |
| Carbon Monoxide SCHEMBL3924423 | 0.92 | CA12 (0.30) | CA12CA1CA2MMP1MMP2 | |
| SCHEMBL336859 | 0.77 | ALDH1A1 (0.37) | CA12CA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11952658-B2 | Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material | ASM IP HOLDING B.V. (NL) | 2024-04-09 | — | — | US | disclosed |
| US-11814715-B2 | Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material | ASM IP HOLDING B.V. (NL) | 2023-11-14 | — | — | US | disclosed |
| US-20230067660-A1 | CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL | ASM IP HOLDING B.V. (NL) | 2023-03-02 | — | — | US | disclosed |
| US-20220389583-A1 | CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL | ASM IP HOLDING B.V. (NL) | 2022-12-08 | — | — | US | disclosed |
| US-11161857-B2 | Metal bicyclic amidinates | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2021-11-02 | — | — | US | disclosed |
| US-20210317576-A1 | CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL | ASM IP HOLDING B.V. (NL) | 2021-10-14 | — | — | US | disclosed |
| US-20210013042-A1 | METHODS FOR FORMING A METALLIC FILM ON A SUBSTRATE BY CYCLICAL DEPOSITION AND RELATED SEMICONDUCTOR DEVICE STRUCTURES | ASM IP HOLDING B.V. (NL) | 2021-01-14 | — | — | US | disclosed |
| US-10741403-B2 | Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures | ASM IP HOLDING B.V. (NL) | 2020-08-11 | — | — | US | disclosed |
| US-20200083054-A1 | METHODS FOR FORMING A METALLIC FILM ON A SUBSTRATE BY CYCLICAL DEPOSITION AND RELATED SEMICONDUCTOR DEVICE STRUCTURES | ASM IP HOLDING B.V. (NL) | 2020-03-12 | — | — | US | disclosed |
| WO-2020002995-A1 | CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL | ASM IP HOLDING B.V. (NL) | 2020-01-02 | — | — | WO | disclosed |
| US-7973189-B2 | Cobalt nitride layers for copper interconnects and methods for forming them | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2011-07-05 | — | — | US | disclosed |
| US-7737290-B2 | Atomic layer deposition using metal amidinates | PRESIDENT AND FELLOWS OF HARVARD UNIVERSITY (US) | 2010-06-15 | — | — | US | disclosed |
| EP-2182088-A1 | Atomic layer deposition using metal amidinates | President and Fellows of Harvard College (US) | 2010-05-05 | — | — | EP | disclosed |
| US-20100092667-A1 | ATOMIC LAYER DEPOSITION USING METAL AMIDINATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2010-04-15 | — | — | US | disclosed |
| EP-1563117-B1 | ATOMIC LAYER DEPOSITION USING METAL AMIDINATES | HARVARD COLLEGE (US) | 2010-01-06 | — | — | EP | disclosed |
| US-20090291208-A1 | ATOMIC LAYER DEPOSITION USING METAL AMIDINATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2009-11-26 | — | — | US | disclosed |
| US-7557229-B2 | Atomic layer deposition using metal amidinates | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2009-07-07 | — | — | US | disclosed |
| US-7557229-B2 | Atomic layer deposition using metal amidinates | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2009-07-07 | — | — | US | disclosed |
| US-20080254232-A1 | Nucleation, adhesion to copper wires; chemical vapor deposition of cobalt amidate ; diffusion barrier for copper; microelectronics | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2008-10-16 | — | — | US | disclosed |
| US-20060141155-A1 | Atomic layer deposition using metal amidinates | HAVARD UNIVERSITY | 2006-06-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11161857-B2 | Metal bicyclic amidinates | SCO2, HAO2, AOC2 | CA12 1040/4885CA1 108/4885CA2 552/4885 |
| US-20100092667-A1 | ATOMIC LAYER DEPOSITION USING METAL AMIDINATES | NIT2, SLC9B2, NOS2 | CA12 699/4885CA1 153/4885CA2 377/4885 |
| US-20090291208-A1 | ATOMIC LAYER DEPOSITION USING METAL AMIDINATES | NIT2, SLC9B2, NOS2 | CA12 699/4885CA1 153/4885CA2 377/4885 |
| US-20080254232-A1 | Nucleation, adhesion to copper wires; chemical vapor deposition of cobalt amidate ; diffusion barrier for copper; microelectronics | NIT2, MYB, INA | CA12 405/4885CA1 75/4885CA2 275/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.