SCHEMBL336859

SCHEMBL336859

CC(C)N=C(NC(C)C)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.37
GAA P10253 1/20 0.37
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
MMP8 P22894 1/20 0.34
CA9 Q16790 1/20 0.34
TSHR P16473 1/20 0.34
MEN1 O00255 1/20 0.32
LMNA P02545 1/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2157672 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
SCHEMBL3926609 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
SCHEMBL3290634 0.77 ALDH1A1 (0.34) ALDH1A1GAACA12CA1CA2
SCHEMBL2944909 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
SCHEMBL2941025 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
SCHEMBL3290453 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
SCHEMBL17536213 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
Lithium Ion SCHEMBL1005375 0.77 CA12 (0.32) ALDH1A1GAACA12CA1CA2
Carbon Monoxide SCHEMBL3924423 0.74 CA12 (0.30) CA12CA1CA2MMP1MMP2
SCHEMBL12004313 0.73 KDM7A (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3323505-B1 HYDROSILYLATION REACTION CATALYST UNIV KYUSHU NAT UNIV CORP (JP) 2024-07-17 EP claimed
US-20230377877-A1 METHODS AND SYSTEMS FOR FORMING MEMORY DEVICES AND COMPONENTS THEREOF ASM IP HOLDING B.V. (NL) 2023-11-23 US claimed
WO-2023124432-A1 FLEXIBLE HIGH-DENSITY INTERCONNECTOR CIRCUIT BOARD AND PREPARATION METHOD THEREOF 宁波华远电子科技有限公司 2023-07-06 WO claimed
CN-109647372-A A kind of methane oxidation coupling C2Hydrocarbon catalyst and its preparation method and application 中国科学院山西煤炭化学研究所 2019-04-19 CN claimed
CN-106336422-A LANTHANUM COMPOUND, METHOD OF SYNTHESIZING LANTHANUM COMPOUND, LANTHANUM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE 三星电子株式会社 2017-01-18 CN claimed
US-9382618-B2 Oxygen-free atomic layer deposition of indium sulfide UChicago Argnonne, LLC (US) 2016-07-05 US claimed
US-20160017485-A1 OXYGEN-FREE ATOMIC LAYER DEPOSITION OF INDIUM SULFIDE UCHICAGO ARGONNE, LLC 2016-01-21 US claimed
US-8617649-B2 Cyclopentadienyl transition metal precursors for deposition of transition metal-containing films AMERICAN AIR LIQUIDE, INC. (US) 2013-12-31 US claimed
US-20130168614-A1 NICKEL ALLYL AMIDINATE PRECURSORS FOR DEPOSITION OF NICKEL-CONTAINING FILMS L'Air Liquide Société Anonyme pour ''Etude et l'Exploitation des Procédés Georges Claude (FR) 2013-07-04 US claimed
US-20130011580-A1 CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS AMERICAN AIR LIQUIDE, INC. (US) 2013-01-10 US claimed
US-8298616-B2 Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films AMERICAN AIR LIQUIDE, INC. (US) 2012-10-30 US claimed
JP-2011529135-A 2011-12-01 JP claimed
EP-2307589-A2 HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2011-04-13 EP claimed
US-7816550-B2 Processes for the production of organometallic compounds PRAXAIR TECHNOLOGY, INC. (US) 2010-10-19 US claimed
WO-2010010538-A2 HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2010-01-28 WO claimed
US-20100021747-A1 HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS AMERICAN AIR LIQUIDE, INC. 2010-01-28 US claimed
EP-1855863-A1 PROCESSES FOR THE PRODUCTION OF ORGANOMETALLIC COMPOUNDS Praxair Technology, Inc. (US) 2007-11-21 EP claimed
US-20060229462-A1 Processes for the production of organometallic compounds PRAXAIR TECHNOLOGY, INC. 2006-10-12 US claimed
WO-2006086329-A1 PROCESSES FOR THE PRODUCTION OF ORGANOMETALLIC COMPOUNDS PRAXAIR TECHNOLOGY, INC. (US) 2006-08-17 WO claimed
US-20060177577-A1 Processes for the production of organometallic compounds PRAXAIR TECHNOLOGY, INC. 2006-08-10 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060177577-A1 Processes for the production of organometallic compounds EML4, AP3M1, PRMT3 ALDH1A1 4039/4885GAA 3742/4885CA12 3652/4885
US-20130168614-A1 NICKEL ALLYL AMIDINATE PRECURSORS FOR DEPOSITION OF NICKEL-CONTAINING FILMS C9, C5, C1R ALDH1A1 3266/4885GAA 4695/4885CA12 3406/4885
US-20060229462-A1 Processes for the production of organometallic compounds EML4, AP3M1, PRMT3 ALDH1A1 4039/4885GAA 3742/4885CA12 3652/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.