Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.64 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.64 |
| ▸ | ESR1 | P03372 | 1/20 | 0.64 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.64 |
| ▸ | F2 | P00734 | 1/20 | 0.55 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.55 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.55 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.55 |
| ▸ | ST14 | Q9Y5Y6 | 1/20 | 0.55 |
| ▸ | LTA4H | P09960 | 5/20 | 0.54 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.54 |
| ▸ | BAX | Q07812 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 1/20 | 0.53 |
| ▸ | RAB9A | P51151 | 1/20 | 0.53 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13157438 | 0.94 | ESR2 (0.56) | MEN1KMT2AESR1ESR2F2 | |
| SCHEMBL6138474 | 0.88 | MEN1 (0.64) | MEN1KMT2AF2PRSS1PRSS2 | |
| SCHEMBL2960969 | 0.86 | MEN1 (0.52) | MEN1KMT2AESR1ESR2F2 | |
| SCHEMBL719268 | 0.83 | ALDH1A1 (0.74) | MEN1KMT2AESR1ESR2LTA4H | |
| SCHEMBL20347020 | 0.83 | ALDH1A1 (0.74) | MEN1KMT2AF2PRSS1PRSS2 | |
| SCHEMBL3653673 | 0.83 | ALDH1A1 (0.74) | MEN1KMT2AF2PRSS1PRSS2 | |
| SCHEMBL16551547 | 0.83 | MEN1 (0.82) | MEN1KMT2AESR1ESR2ST14 | |
| SCHEMBL1362217 | 0.81 | MAOB (0.70) | MEN1KMT2AESR1ESR2F2 | |
| SCHEMBL249169 | 0.80 | ESR2 (1.00) | MEN1KMT2AESR1ESR2LTA4H | |
| SCHEMBL18198 | 0.80 | ESR2 (1.00) | MEN1KMT2AESR1ESR2LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117700740-A | Polyimide containing benzoxazine suspension side group and preparation method and application thereof | 华烁科技股份有限公司 | 2024-03-15 | — | — | CN | disclosed |
| CN-117701232-A | Low-dielectric non-fluorine modified polyimide and preparation method and application thereof | 华烁科技股份有限公司 | 2024-03-15 | — | — | CN | disclosed |
| CN-117384482-A | Non-fluorine modified polyimide, low-dielectric flexible copper-clad plate and preparation method thereof | 华烁电子材料(武汉)有限公司 | 2024-01-12 | — | — | CN | disclosed |
| CN-112759763-B | Polyimide composite glue solution, black matte polyimide material, preparation and application | 株洲时代新材料科技股份有限公司 | 2022-05-17 | — | — | CN | disclosed |
| CN-112759763-A | Polyimide composite glue solution, black matte polyimide material, preparation and application | 株洲时代新材料科技股份有限公司 | 2021-05-07 | — | — | CN | disclosed |
| US-9488911-B2 | Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20150362836-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
| US-7560307-B2 | Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-07-14 | — | — | US | disclosed |
| US-20060180908-A1 | Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same | YANO YASUHIRO | 2006-08-17 | — | — | US | disclosed |
| US-7061081-B2 | Comprises polyamideetherimide or polyether amide; for use as coating material, adhesive and stress releasing material; controlled elasticity; dielectrics; electronics | HITACHI CHEMICAL CO., LTD. (JP) | 2006-06-13 | — | — | US | disclosed |
| US-20030082925-A1 | Comprises polyamideetherimide or polyether amide; for use as coating material, adhesive and stress releasing material; controlled elasticity; dielectrics; electronics | HITACHI CHEMICAL CO., LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150362836-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | POLQ, POLR1A, POLI | MEN1 607/4885KMT2A 921/4885ESR1 99/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.