Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | PNMT | P11086 | 2/20 | 0.40 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.39 |
| ▸ | DPP4 | P27487 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.35 |
| ▸ | RORC | P51449 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3844173 | 0.84 | TSHR (0.52) | TSHRTAAR1 | |
| SCHEMBL9838740 | 0.83 | TSHR (0.59) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL3627333 | 0.83 | TSHR (0.59) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL5353085 | 0.81 | TSHR (0.57) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL6312079 | 0.81 | DPP4 (0.43) | TSHRPNMTTAAR1DPP4NISCH | |
| SCHEMBL3842151 | 0.81 | PNMT (0.41) | TSHRPNMTTAAR1DPP4NISCH | |
| SCHEMBL28208053 | 0.80 | PNMT (0.44) | TSHRPNMTTAAR1DPP4GABRA1 | |
| SCHEMBL394900 | 0.80 | GABRA1 (0.44) | TSHRPNMTTAAR1DPP4GABRA1 | |
| SCHEMBL994607 | 0.79 | TSHR (0.73) | TSHRTAAR1KDM4EL3MBTL1GABRA1 | |
| SCHEMBL9643567 | 0.79 | PNMT (0.40) | TSHRPNMTTAAR1DPP4L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9939729-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-04-10 | — | — | US | disclosed |
| US-20170291982-A1 | A SELF-HEALING, REPROCESSABLE AND RECYCLABLE CROSSLINKED POLYMER AND PROCESS FOR ITS PREPARATION | FUNDACIÓN CIDETEC (ES) | 2017-10-12 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9695260-B2 | Method for producing olefin block polymer using plurality of types of transition metal catalysts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-07-04 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20170075224-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-9593194-B2 | Method for producing olefin block polymer using group 4 transition metal complex | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-03-14 | — | — | US | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20160327866-A1 | PATTERN FORMING METHOD, TREATING AGENT, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160195814-A1 | PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT | FUJIFILM CORPORATION (JP) | 2016-07-07 | — | — | US | disclosed |
| US-20030203810-A1 | Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-10-30 | — | — | US | disclosed |
| US-6586356-B2 | Coordination catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20030069127-A1 | Modified particle,support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMTED (JP) | 2003-04-10 | — | — | US | disclosed |
| EP-1300425-A2 | Catalyst component for addition polymerization, process for producing said catalyst and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-20030060579-A1 | Catalyst component for addition polymerization, process for producing catalyst for addition polymerization and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-27 | — | — | US | disclosed |
| CN-1387519-A | 2-imino-1, 3-thiazine derivatives | SHIONOGI & CO (JP) | 2002-12-25 | — | — | CN | disclosed |
| US-20020143124-A1 | Homogeneous type solid catalyst component or homogeneous type solid catalyst, process for production thereof and process for producing addition polymer with the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-03 | — | — | US | disclosed |
| EP-1219612-A1 | 2-IMINO-1,3-THIAZINE DERIVATIVES | SHIONOGI & CO., LTD. (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-20010020075-A1 | Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-09-06 | — | — | US | disclosed |
| EP-1113026-A2 | Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-07-04 | — | — | EP | disclosed |