SCHEMBL6312079

SCHEMBL6312079

CCC(c1ccccc1CN)c1ccccc1CN

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DPP4 P27487 2/20 0.43
PNMT P11086 3/20 0.41
GPR84 Q9NQS5 1/20 0.40
TSHR P16473 1/20 0.38
LOXL2 Q9Y4K0 1/20 0.37
TAAR1 Q96RJ0 5/20 0.35
LMNA P02545 1/20 0.35
HTR2A P28223 1/20 0.34
OPRM1 P35372 2/20 0.34
OPRD1 P41143 2/20 0.34
OPRK1 P41145 2/20 0.34
OPRL1 P41146 2/20 0.34
IDO1 P14902 1/20 0.33
TDO2 P48775 1/20 0.33
NISCH Q9Y2I1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27860164 0.92 HTR2A (0.46) DPP4PNMTTSHRTAAR1LMNA
SCHEMBL6313120 0.83 TAAR1 (0.50) GPR84LOXL2TAAR1HTR2AIDO1
SCHEMBL3842151 0.83 PNMT (0.41) DPP4PNMTTSHRLOXL2TAAR1
SCHEMBL394464 0.81 TSHR (0.55) DPP4PNMTTSHRTAAR1NISCH
SCHEMBL9643567 0.81 PNMT (0.40) DPP4PNMTTSHRTAAR1OPRM1
SCHEMBL17180600 0.79 LMNA (0.47) DPP4PNMTTSHRLMNAOPRM1
SCHEMBL394900 0.77 GABRA1 (0.44) DPP4PNMTTSHRTAAR1LMNA
SCHEMBL28208053 0.77 PNMT (0.44) DPP4PNMTTSHRLOXL2TAAR1
SCHEMBL24244198 0.76 TAAR1 (0.47) LOXL2TAAR1LMNAHTR2A
SCHEMBL27651476 0.76 PNMT (0.43) DPP4PNMTTAAR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112939915-A Diamine monomer for photosensitive resin, polyimide precursor, photosensitive resin composition, and use thereof 武汉柔显科技股份有限公司 2021-06-11 CN disclosed
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed