Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1122469 | 0.77 | ALDH1A1 (0.39) | MAPK1HSD11B1LMNAL3MBTL1EPHX2 | |
| SCHEMBL10150478 | 0.75 | PPM1B (0.44) | MAPK1CYP2C9HSD11B1LMNAL3MBTL1 | |
| SCHEMBL21110908 | 0.75 | CYP2C9 (0.39) | CYP2C9HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL11005084 | 0.71 | EPHX2 (0.41) | MAPK1HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL13974646 | 0.68 | PPM1B (0.39) | MAPK1CYP2C9HSD11B1LMNAL3MBTL1 | |
| SCHEMBL29117542 | 0.67 | HSD11B1 (0.37) | MAPK1HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL18045654 | 0.67 | HSD11B1 (0.47) | MAPK1HSD11B1LMNAL3MBTL1EPHX2 | |
| SCHEMBL18998718 | 0.67 | — | — | |
| Adamantane SCHEMBL29167166 | 0.67 | THRB (0.52) | LMNA | |
| SCHEMBL29117558 | 0.66 | MAPK1 (0.36) | MAPK1HSD11B1LMNAL3MBTL1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7479364-B2 | lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-20 | — | — | US | disclosed |
| US-7358027-B2 | Used to generate resist images on a substrate, i.e., in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-20080085473-A1 | lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. | GLOBALFOUNDRIES U.S. INC. | 2008-04-10 | — | — | US | disclosed |
| US-20030186160-A1 | Used to generate resist images on a substrate, i.e., in the manufacture of integrated circuits | GLOBALFOUNDRIES U.S. INC. | 2003-10-02 | — | — | US | disclosed |