SCHEMBL3955962

SCHEMBL3955962

C=C(c1ccc(C(=C)[Si](C)(C)OC)cc1)[Si](C)(C)OC

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.33
NR1I2 O75469 1/20 0.32
CES2 O00748 1/20 0.30
CES1 P23141 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3951762 0.82 CES2 (0.34) CES2CES1
SCHEMBL3955257 0.77 MAPT (0.34) MAPTCES2CES1
SCHEMBL3955265 0.76 TSHR (0.33)
SCHEMBL3956054 0.69 MAPT (0.32) MAPT
SCHEMBL1408930 0.67 TSHR (0.41) MAPTCES2CES1
SCHEMBL5373908 0.66 TSHR (0.33) MAPTCES2CES1
SCHEMBL3948918 0.66
SCHEMBL23493463 0.65 MAPT (0.41) MAPT
SCHEMBL12937609 0.64 MAPT (0.33) MAPT
SCHEMBL6516146 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556860-B2 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2009-07-07 US disclosed
US-20060216531-A1 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-09-28 US disclosed
EP-1679184-A1 LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-07-12 EP disclosed