Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Biphenyl. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.60 |
| ▸ | TSHR | P16473 | 1/20 | 0.60 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.55 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.53 |
| ▸ | HTT | P42858 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 4/20 | 0.50 |
| ▸ | CA1 | P00915 | 3/20 | 0.50 |
| ▸ | MMP1 | P03956 | 1/20 | 0.50 |
| ▸ | MMP2 | P08253 | 1/20 | 0.50 |
| ▸ | MMP9 | P14780 | 1/20 | 0.50 |
| ▸ | MMP8 | P22894 | 1/20 | 0.50 |
| ▸ | MMP13 | P45452 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 4/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL1157673 | 0.98 | SMN1; SMN2 (0.58) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| Toluene SCHEMBL180606 | 0.91 | SMN1; SMN2 (0.65) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| SCHEMBL932442 | 0.91 | SMN1; SMN2 (0.73) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| SCHEMBL13836876 | 0.91 | SMN1; SMN2 (0.73) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| Benzene SCHEMBL5085625 | 0.91 | SMN1; SMN2 (0.64) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| Water SCHEMBL14660542 | 0.89 | SMN1; SMN2 (0.70) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| Toluene SCHEMBL2419102 | 0.89 | SMN1; SMN2 (0.62) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| Benzene SCHEMBL28320383 | 0.89 | SMN1; SMN2 (0.61) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| Toluene SCHEMBL10924679 | 0.89 | TSHR (0.68) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA | |
| SCHEMBL2894715 | 0.89 | PKM (0.55) | SMN1; SMN2TSHRCYP2D6MAPK1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240158424-A1 | METHOD FOR PRODUCING DIPHOSPHINE MONOXIDE | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| EP-4361162-A2 | METHOD FOR PRODUCING DIPHOSPHINE MONOXIDE | Takasago International Corporation (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-104281006-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2015-01-14 | — | — | CN | disclosed |
| CN-1942825-B | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2010-05-12 | — | — | CN | disclosed |
| US-7476485-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2009-01-13 | — | — | US | disclosed |
| US-7214743-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| CN-1942825-A | Resist composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-04 | — | — | CN | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| CN-1245664-C | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORP (JP) | 2006-03-15 | — | — | CN | disclosed |
| US-20050014092-A1 | Novel compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040241577-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| WO-1997048677-A1 | NON-IONIC PHOTOACID GENERATORS WITH IMPROVED QUANTUM EFFICIENCY | PPG INDUSTRIES, INC. (US) | 1997-12-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240158424-A1 | METHOD FOR PRODUCING DIPHOSPHINE MONOXIDE | TDO2, SCO2, DUOX1 | SMN1; SMN2 3749/4885TSHR 4075/4885CYP2D6 282/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.