Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | PARP11 | Q9NR21 | 1/20 | 0.50 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.50 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.50 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.47 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.46 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL598903 | 0.94 | TSHR (0.58) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL31040985 | 0.94 | PARP11 (0.54) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL3982676 | 0.93 | ALDH1A1 (0.47) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL6901227 | 0.86 | CALM1 (0.50) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL7182969 | 0.86 | NPC1 (0.52) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL31739245 | 0.84 | TSHR (0.47) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL7195015 | 0.82 | GPR84 (0.60) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL9080133 | 0.81 | ALDH1A1 (0.50) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL25491471 | 0.80 | PDE10A (0.45) | TSHRALDH1A1ATMNPSR1NPC1 | |
| SCHEMBL25491465 | 0.80 | PDE10A (0.45) | TSHRALDH1A1ATMNPSR1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024147917-A1 | DIELECTRIC FILM FORMING COMPOSITION CONTAINING ACYL GERMANIUM COMPOUND | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-07-11 | — | — | WO | disclosed |
| EP-4232421-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2023-08-30 | — | — | EP | disclosed |
| EP-4118679-A1 | METAL DEPOSITION PROCESSES | Fujifilm Electronic Materials U.S.A., Inc. (US) | 2023-01-18 | — | — | EP | disclosed |
| EP-4091000-A1 | DRY FILM | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2022-11-23 | — | — | EP | disclosed |
| WO-2022086752-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-04-28 | — | — | WO | disclosed |
| WO-2021183472-A1 | METAL DEPOSITION PROCESSES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-09-16 | — | — | WO | disclosed |
| WO-2021067547-A1 | PLANARIZING PROCESS AND COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-04-08 | — | — | WO | disclosed |
| CN-106414516-B | Transition metal compound, catalyst composition comprising the same, and method for preparing polyolefin | 株式会社LG化学 | 2019-05-14 | — | — | CN | disclosed |
| EP-3478482-A1 | DIELECTRIC FILM FORMING COMPOSITION | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2019-05-08 | — | — | EP | disclosed |
| EP-3478777-A1 | DIELECTRIC FILM FORMING COMPOSITION | FUJIFILM Electronic Materials U.S.A., Inc. (US) | 2019-05-08 | — | — | EP | disclosed |
| CN-1636041-A | Radiation-curable compositions and related methods for the assembly and repair of optical components and products prepared thereby | DSM NV (NL) | 2005-07-06 | — | — | CN | disclosed |
| CN-1208687-C | High-resolution photosnesiitve resin composition usable with I-line and method of forming patter | AZ ELECTRONIC MATERIALS JAPAN (JP) | 2005-06-29 | — | — | CN | disclosed |
| WO-2004111726-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2004-12-23 | — | — | WO | disclosed |
| CN-1169021-C | Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition | 克拉瑞特金融(BVI)有限公司 | 2004-09-29 | — | — | CN | disclosed |
| WO-2004081664-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-09-23 | — | — | WO | disclosed |
| CN-1401096-A | High resolution photosensitive resin composition for i-line and method of forming pattern | CLARIANT INT LTD (CH) | 2003-03-05 | — | — | CN | disclosed |
| CN-1377328-A | Radiation-curable composition with simultaneous color formation during cure | DSM NV (NL) | 2002-10-30 | — | — | CN | disclosed |
| CN-1313962-A | Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition | CLARIANT INT LTD (CH) | 2001-09-19 | — | — | CN | disclosed |
| EP-0964901-A1 | COAL TAR EXTRACT WITH REDUCED AROMATIC HYDROCARBON CONTENT, METHOD FOR OBTAINING SAME AND DERMATOLOGICAL AND COSMETIC COMPOSITIONS | Pierre Fabre Dermo-Cosmetique (FR) | 1999-12-22 | — | — | EP | disclosed |
| WO-1998040447-A1 | COAL TAR EXTRACT WITH REDUCED AROMATIC HYDROCARBON CONTENT, METHOD FOR OBTAINING SAME AND DERMATOLOGICAL AND COSMETIC COMPOSITIONS | PIERRE FABRE DERMO-COSMETIQUE (FR) | 1998-09-17 | — | — | WO | disclosed |