SCHEMBL3988149

SCHEMBL3988149

C=C(C)C(=O)OCCCC(N)=O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.60
THRB P10828 1/20 0.52
TDP1 Q9NUW8 2/20 0.45
POLB P06746 2/20 0.45
APEX1 P27695 1/20 0.45
HTT P42858 1/20 0.45
ALDH1A1 P00352 5/20 0.40
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM5 P08912 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
HPGD P15428 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CYP3A4 P08684 2/20 0.31
MEN1 O00255 1/20 0.31
FAAH O00519 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6358410 0.94 TSHR (0.63) TSHRTHRBTDP1POLBAPEX1
SCHEMBL8608732 0.92 TSHR (0.67) TSHRTHRBTDP1POLBAPEX1
SCHEMBL2522045 0.89 THRB (0.53) TSHRTHRBTDP1POLBAPEX1
SCHEMBL9160051 0.87 TSHR (0.51) TSHRTHRBTDP1POLBAPEX1
SCHEMBL7919723 0.85 TSHR (0.62) TSHRTHRBTDP1POLBAPEX1
SCHEMBL22440439 0.85 TSHR (0.62) TSHRTHRBTDP1POLBAPEX1
SCHEMBL255879 0.85 TSHR (0.62) TSHRTHRBTDP1POLBAPEX1
SCHEMBL25426 0.84 TSHR (0.79) TSHRTHRBTDP1POLBAPEX1
SCHEMBL182045 0.84 TSHR (0.72) TSHRTHRBTDP1POLBAPEX1
SCHEMBL5144090 0.84 TSHR (0.79) TSHRTHRBTDP1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8109160-A None JP disclosed
EP-3313902-B1 A PROCESS FOR PRODUCING AN ETHYLENE-BASED POLYMER DOW GLOBAL TECHNOLOGIES LLC (US) 2023-07-19 EP disclosed
US-20230203221-A1 MONOMERS, POLYMERS, AND ARTICLES FOR BIOMATERIAL CAPTURE SOLVENTUM INTELLECTUAL PROPERTIES COMPANY 2023-06-29 US disclosed
US-20220214616-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-07-07 US disclosed
US-20220214619-A1 PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-07-07 US disclosed
US-7964334-B2 Mixture containing urea compound as photoinitiator; curing by exposure to laser light FUJIFILM CORPORATION (JP) 2011-06-21 US disclosed
US-7479514-B2 Adhesion promoting composition and method BASF CORPORATION (US) 2009-01-20 US disclosed
WO-2006041559-A1 ADHESION PROMOTING COMPOSITION AND METHOD BASF CORPORATION (US) 2006-04-20 WO disclosed
US-20060074163-A1 An adhesion promoting formulation includes a polymer, such as an acrylic copolymer, having acetoacetoxy functionality and adhesion-promoting functionality and a metal alkoxide, chelate, and/or alkoxide chelate; coating over a metal surface or coated surface; refinishing; automobiles BASF CORPORATION (US) 2006-04-06 US disclosed
EP-0697400-B1 Amide monomer and polymer prepared therefrom NIPPON PAINT CO LTD (JP) 1998-04-08 EP disclosed
JP-H08109160-A NEW AMIDE MONOMER AND POLYMER PRODUCED THEREFROM NIPPON PAINT CO LTD 1996-04-30 JP disclosed
EP-0697400-A2 Amide monomer and polymer prepared therefrom Nippon Paint Co., Ltd. (JP) 1996-02-21 EP disclosed
US-4064110-A FROM 5-ALKOXYMETHYL-1,3,4-DIOXAZOL-2-ONES, ALKALI METAL CARBOXYLATE CATALYST BAYER AKTIENGESELLSCHAFT (DT) 1977-12-20 US disclosed