SCHEMBL6358410

SCHEMBL6358410

C=C(C)C(=O)OCCCCC(N)=O

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.63
THRB P10828 1/20 0.50
TDP1 Q9NUW8 2/20 0.47
POLB P06746 2/20 0.47
APEX1 P27695 1/20 0.47
HTT P42858 1/20 0.47
ALDH1A1 P00352 6/20 0.39
PRSS1 P07477 1/20 0.36
PRSS2 P07478 1/20 0.36
PRSS3 P35030 1/20 0.36
CYP3A4 P08684 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MEN1 O00255 1/20 0.33
FAAH O00519 1/20 0.33
TP53 P04637 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C19 P33261 1/20 0.33
SOAT1 P35610 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8608732 0.98 TSHR (0.67) TSHRTHRBTDP1POLBAPEX1
SCHEMBL3988149 0.94 TSHR (0.60) TSHRTHRBTDP1POLBAPEX1
SCHEMBL2522045 0.88 THRB (0.53) TSHRTHRBTDP1POLBAPEX1
SCHEMBL5144090 0.87 TSHR (0.79) TSHRTHRBTDP1POLBAPEX1
SCHEMBL25426 0.87 TSHR (0.79) TSHRTHRBTDP1POLBAPEX1
SCHEMBL9580313 0.86 TSHR (0.66) TSHRTHRBTDP1POLBAPEX1
SCHEMBL22440464 0.86 TSHR (0.66) TSHRTHRBTDP1POLBAPEX1
SCHEMBL22554400 0.85 TSHR (0.83) TSHRTHRBTDP1POLBAPEX1
SCHEMBL22554427 0.85 TSHR (0.83) TSHRTHRBTDP1POLBAPEX1
SCHEMBL22554413 0.85 TSHR (0.83) TSHRTHRBTDP1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220214619-A1 PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-07-07 US disclosed
US-20220214616-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-07-07 US disclosed
EP-1591462-A2 Temperature-responsive polymer compound and process for producing the same Amersham Biosciences KK (JP) 2005-11-02 EP disclosed
US-6956077-B1 Temperature-responsive polymer compound and process for producing the same AMERSHAM BIOSCIENCES KK (JP) 2005-10-18 US disclosed
US-20050224415-A1 Temperature-responsive polymer compound and process for producing the same AMERSHAM BIOSCIENCES KK 2005-10-13 US disclosed
EP-1153049-A1 TEMPERATURE-RESPONSIVE POLYMER COMPOUND AND PROCESS FOR PRODUCING THE SAME Amersham Pharmacia Biotech K.K. (JP) 2001-11-14 EP disclosed
WO-2000044800-A1 TEMPERATURE-RESPONSIVE POLYMER COMPOUND AND PROCESS FOR PRODUCING THE SAME AMERSHAM PHARMACIA BIOTECH K.K. (JP) 2000-08-03 WO disclosed
EP-0697400-B1 Amide monomer and polymer prepared therefrom NIPPON PAINT CO LTD (JP) 1998-04-08 EP disclosed
EP-0697400-A2 Amide monomer and polymer prepared therefrom Nippon Paint Co., Ltd. (JP) 1996-02-21 EP disclosed