SCHEMBL399173

SCHEMBL399173

CCCCC[SiH](O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6841496 0.97 TSHR (0.50)
SCHEMBL6841494 0.97 TSHR (0.50)
SCHEMBL4293102 0.97 TSHR (0.50)
SCHEMBL6841034 0.97 TSHR (0.50)
SCHEMBL968834 0.97 TSHR (0.50)
SCHEMBL968567 0.97 TSHR (0.50)
SCHEMBL6841441 0.97 TSHR (0.50)
SCHEMBL970152 0.90
SCHEMBL4521500 0.83 TSHR (0.59)
SCHEMBL851446 0.83 CES2 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2409710-A1 Injectable material and material to be used as drug or food supplement for prophylaxis or treatment of osteoporosis NanotecMARIN GmbH (DE) 2012-01-25 EP claimed
EP-2409710-A1 Injectable material and material to be used as drug or food supplement for prophylaxis or treatment of osteoporosis NanotecMARIN GmbH (DE) 2012-01-25 EP disclosed
US-6764807-B2 LITHOGRAPHY KODAK POLYCHROME GRAPHICS LLC 2004-07-20 US disclosed
US-20020086235-A1 Lithography EASTMAN KODAK COMPANY 2002-07-04 US disclosed
US-6399271-B1 HYDROXY CONTAINING COMPOUND WITH AFFINITY FOR INK, AND TITANIUM OR SILICON CONTAINING COMPOUND WITH DIFFERENT AFFINITY FOR INK KODAK POLYCHROME GRAPHICS LLC 2002-06-04 US disclosed
EP-1021301-A1 PLANOGRAPHIC PRINTING Kodak Polychrome Graphics Company Ltd. (US) 2000-07-26 EP disclosed
WO-1999014048-A1 PLANOGRAPHIC PRINTING KODAK POLYCHROME GRAPHICS COMPANY LTD (US) 1999-03-25 WO disclosed
EP-0377175-A2 Pattern forming composition and process for forming pattern using the same HITACHI, LTD. (JP) 1990-07-11 EP disclosed
EP-0319384-A2 Cerium hydrocarbonsilyloxydes and process for their manufacture RHONE-POULENC CHIMIE (FR) 1989-06-07 EP disclosed
EP-0319383-A2 Process for the fabrication of cerium hydrocarbonsilyloxides by transetherification of cerium alkoxides RHONE-POULENC CHIMIE (FR) 1989-06-07 EP disclosed