Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.51 |
| ▸ | HPGD | P15428 | 2/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | BLM | P54132 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
| ▸ | NCEH1 | Q6PIU2 | 3/20 | 0.50 |
| ▸ | CNR2 | P34972 | 3/20 | 0.49 |
| ▸ | CTSD | P07339 | 1/20 | 0.48 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.48 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.48 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30742709 | 1.00 | MAPT (0.55) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL23499947 | 0.86 | CNR2 (0.59) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL3357585 | 0.84 | NCEH1 (0.65) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL979842 | 0.84 | CA12 (0.58) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL30676839 | 0.84 | NCEH1 (0.65) | MAPTKDM4EHPGDLMNAMEN1 | |
| Hydrochloric Acid SCHEMBL5403782 | 0.83 | CA12 (0.56) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL3915104 | 0.83 | NCEH1 (0.70) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL10966660 | 0.83 | MAPT (0.55) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL10617741 | 0.83 | NCEH1 (0.57) | MAPTKDM4EHPGDLMNAMEN1 | |
| SCHEMBL2113634 | 0.83 | MAPT (0.55) | MAPTKDM4EHPGDLMNAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10345706-B2 | Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition | CHEIL INDUSTRIES, INC. (KR) | 2019-07-09 | — | — | US | disclosed |
| US-10066057-B2 | Organic layer composition, organic layer, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2018-09-04 | — | — | US | disclosed |
| US-9665003-B2 | Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns | CHEIL INDUSTRIES, INC. (KR) | 2017-05-30 | — | — | US | disclosed |
| US-9556094-B2 | Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition | CHEIL INDUSTRIES, INC. (KR) | 2017-01-31 | — | — | US | disclosed |
| US-20160297932-A1 | ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-10-13 | — | — | US | disclosed |
| US-9359276-B2 | Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition | CHEIL INDUSTRIES, INC. (KR) | 2016-06-07 | — | — | US | disclosed |
| US-20150274622-A1 | MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION | CHEIL INDUSTRIES INC. (KR) | 2015-10-01 | — | — | US | disclosed |
| US-8952373-B2 | Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns | CHEIL INDUSTRIES, INC. (KR) | 2015-02-10 | — | — | US | disclosed |
| US-20150008212-A1 | MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION | CHEIL INDUSTRIES, INC. (KR) | 2015-01-08 | — | — | US | disclosed |
| US-20150004531-A1 | HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS | CHEIL INDUSTRIES, INC. (KR) | 2015-01-01 | — | — | US | disclosed |
| US-20040048913-A1 | Substituted biaryl amides as C5a receptor modulators | NOVARTIS INTERNATIONAL PHARMACEUTICAL LTD. (BM) | 2004-03-11 | — | — | US | disclosed |
| WO-2003082826-A1 | SUBSTITUTED BIARYL AMIDES AS C5A RECEPTOR MODULATORS | NEUROGEN CORPORATION (US) | 2003-10-09 | — | — | WO | disclosed |
| EP-1119551-A1 | NAPHTHALENECARBOXAMIDES AS TACHYKININ RECEPTOR ANTAGONISTS | AstraZeneca AB (SE) | 2001-08-01 | — | — | EP | disclosed |
| WO-2000020389-A1 | NAPHTHALENECARBOXAMIDES AS TACHYKININ RECEPTOR ANTAGONISTS | ASTRAZENECA AB (SE) | 2000-04-13 | — | — | WO | disclosed |
| EP-0117228-B1 | ANALOGS OF MEVALONOLACTONE AND DERIVATIVES THEREOF, PROCESSES FOR THEIR PRODUCTION, PHARMACEUTICAL COMPOSITIONS CONTAINING THEM AND THEIR USE AS PHARMACEUTICALS | SANDOZ AG (CH) | 1986-11-05 | — | — | EP | disclosed |
| EP-0117228-A1 | Analogs of mevalonolactone and derivatives thereof, processes for their production, pharmaceutical compositions containing them and their use as pharmaceuticals | SANDOZ AG (CH) | 1984-08-29 | — | — | EP | disclosed |
| WO-1984002903-A1 | MEVALONOLACTONE ANALOGS, THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS | SANDOZ AG (CH) | 1984-08-02 | — | — | WO | disclosed |
| US-4108877-A | REACTING ACYL HALIDE WITH COPPER CYANIDE WITH HEATING IN THE PRESENCE OF A CARBOXYLIC ACID NITRILE AND AN ORGANIC SOLVENT | DEUTSCHE GOLD- UND SILBER-SCHEIDEANSTALT VORMALS ROESSLER (DE) | 1978-08-22 | — | — | US | disclosed |
| US-4108875-A | REACTING ACYL HALIDE WITH AN ALKALI METAL CYANIDE AND A COPPER(I) SALT IN THE PRESENCE OF A CARBOXYLIC ACID NITRILE WITH HEATING | DEUTSCHE GOLD- UND SILBER-SCHEIDEANSTALT VORMALS ROESSLER (DE) | 1978-08-22 | — | — | US | disclosed |
| US-4018767-A | 5-ENDO-(1-NAPHTHOYLOXY)-N-(AMINOALKYL) BICYCLO(2.2.1)HEPTANE-2,3-DI-ENDO-CARBOXYLIC ACID IMIDES | BRISTOL-MYERS COMPANY (US) | 1977-04-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150008212-A1 | MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION | DDRGK1, MINK1, DNM1 | MAPT 1466/4885KDM4E 3983/4885HPGD 3868/4885 |
| US-20040048913-A1 | Substituted biaryl amides as C5a receptor modulators | C5AR1, C5AR2, C3AR1 | MAPT 4555/4885KDM4E 3896/4885HPGD 2688/4885 |
| US-10345706-B2 | Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition | ARCN1, DDRGK1, ACTN1 | MAPT 1485/4885KDM4E 4056/4885HPGD 3872/4885 |
| US-20150274622-A1 | MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION | AP1M1, AP3M1, MNS1 | MAPT 2147/4885KDM4E 4601/4885HPGD 3945/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.