Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 5/20 | 0.49 |
| ▸ | CYP2C9 | P11712 | 5/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 5/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.49 |
| ▸ | HSPA5 | P11021 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.40 |
| ▸ | HSP90AA1 | P07900 | 5/20 | 0.38 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27420293 | 0.84 | AMY1A (0.68) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL27420295 | 0.84 | AMY1A (0.68) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL1994665 | 0.81 | AMY1A (0.63) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL30320307 | 0.81 | AMY1A (0.63) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL8077742 | 0.79 | AMY1A (0.61) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL23720968 | 0.79 | AMY1A (0.43) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL69852 | 0.78 | HSPA5 (0.53) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL14461926 | 0.77 | CYP2C9 (0.55) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL23339864 | 0.76 | AMY1A (0.67) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL13609011 | 0.75 | CYP2C9 (0.66) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210284788-A1 | THERMALLY CONDUCTIVE MATERIAL-FORMING COMPOSITION, THERMALLY CONDUCTIVE MATERIAL, THERMALLY CONDUCTIVE SHEET, DEVICE WITH THERMALLY CONDUCTIVE LAYER, AND FILM | FUJIFILM CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| EP-0685766-B1 | Selected trinuclear novolak oligomers | OLIN MICROELECTRONIC CHEM INC (US) | 2001-09-26 | — | — | EP | disclosed |
| EP-0740213-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0477691-B2 | Positive-type photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-03-07 | — | — | EP | disclosed |
| EP-0886183-A1 | Positive-working photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1998-12-23 | — | — | EP | disclosed |
| EP-0744661-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1998-10-07 | — | — | EP | disclosed |
| US-5750310-A | BLEND OF ALKALI SOLUBLE RESIN, 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID AND TETRAHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-12 | — | — | US | disclosed |
| EP-0451170-B1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMER DERIVATIVES AS PHOTOACTIVE COMPOUNDS AND THEIR USE IN RADIATION SENSITIVE MIXTURES | OCG MICROELECTRONIC MATERIALS (US) | 1996-04-24 | — | — | EP | disclosed |
| EP-0685766-A1 | Selected trinuclear novolak oligomers and their use in photo-active compounds and radiation sensitive mixtures | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1995-12-06 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| US-5340686-A | Alkali soluble phenol novolak resin, 1,2-quinone diazide compound and low molecular weight novolak compound | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0477691-A2 | Positive-type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1992-04-01 | — | — | EP | disclosed |
| EP-0445680-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |
| US-4992356-A | Positive photoresists | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4992596-A | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4957846-A | PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-09-18 | — | — | US | disclosed |
| WO-1990007538-A1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-07-12 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | AMY1A 2387/4885HIF1A 72/4885CYP2C9 1479/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.