SCHEMBL9716575

SCHEMBL9716575

CC[Si](CCc1ccccc1)(OC)OC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.41
ALDH1A1 P00352 2/20 0.39
TP53 P04637 1/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
KDM4E B2RXH2 1/20 0.38
LMNA P02545 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
ALOX12 P18054 1/20 0.38
CASP1 P29466 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TAAR1 Q96RJ0 3/20 0.38
CMA1 P23946 1/20 0.38
ATM Q13315 1/20 0.38
KEAP1 Q14145 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
CHRM2 P08172 1/20 0.37
HTR1A P08908 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9716603 0.90 TDP1 (0.46) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL29040556 0.89 MAOA (0.44) MEN1KMT2ACHRM2HTR1AADRA2A
SCHEMBL27353080 0.88 TDP1 (0.41) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL4075450 0.82 ALDH1A1 (0.46) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL14015584 0.82 TDP1 (0.50) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL4074034 0.82 TDP1 (0.40) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL4076426 0.82 TDP1 (0.45) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL534035 0.81 TP53 (0.44) TDP1ALDH1A1TP53KDM4EMEN1
SCHEMBL15737673 0.81 TAAR1 (0.41) LMNAHPGDTAAR1AOC3
SCHEMBL2010657 0.81 APP (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9534087-B2 Method for manufacturing polysilsesquioxane by using carbon dioxide solvent and polysilsesquioxane manufactured using the same KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2017-01-03 US disclosed
US-20160096930-A1 METHOD FOR MANUFACTURING POLYSILSESQUIOXANE BY USING CARBON DIOXIDE SOLVENT AND POLYSILSESQUIOXANE MANUFACTURED USING THE SAME KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2016-04-07 US disclosed
US-20160096930-A1 METHOD FOR MANUFACTURING POLYSILSESQUIOXANE BY USING CARBON DIOXIDE SOLVENT AND POLYSILSESQUIOXANE MANUFACTURED USING THE SAME KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2016-04-07 US disclosed
EP-0282341-B1 PROCESS FOR POLYMERIZATION OF OLEFINS AND POLYMERIZATION CATALYST MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1992-05-20 EP disclosed