Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | GOT1 | P17174 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | CHEK1 | O14757 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | DOT1L | Q8TEK3 | 1/20 | 0.31 |
| ▸ | CDK1 | P06493 | 1/20 | 0.31 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.31 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.31 |
| ▸ | CCNE1 | P24864 | 1/20 | 0.31 |
| ▸ | CDK2 | P24941 | 1/20 | 0.31 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9970901 | 0.82 | — | — | |
| SCHEMBL2491280 | 0.82 | — | — | |
| SCHEMBL564890 | 0.82 | — | — | |
| SCHEMBL12143122 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL5574787 | 0.80 | KMT2A (0.47) | L3MBTL1MEN1KMT2AALDH1A1GAA | |
| SCHEMBL10234017 | 0.78 | JAK3 (0.34) | — | |
| SCHEMBL3596376 | 0.77 | L3MBTL1 (0.32) | L3MBTL1 | |
| SCHEMBL15777833 | 0.77 | CHEK1 (0.42) | L3MBTL1ALDH1A1GAAKDM4ELMNA | |
| SCHEMBL12705674 | 0.77 | JAK3 (0.40) | L3MBTL1ALDH1A1EGFRCHEK1NPC1 | |
| SCHEMBL4751914 | 0.77 | HRH4 (0.36) | L3MBTL1MEN1KMT2AGAAKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115326905-B | Preparation method and application of photoelectrochemical sensor | 广州大学 | 2025-01-03 | — | — | CN | claimed |
| CN-117720585-A | Pyrimidine dihydrazone tetranuclear Fe (II) complex containing quinoline structure and preparation method and application thereof | 河南中医药大学 | 2024-03-19 | — | — | CN | claimed |
| CN-117700434-A | Tetranuclear node Zn (II) complex with anti-tumor activity and preparation method and application thereof | 河南中医药大学 | 2024-03-15 | — | — | CN | claimed |
| CN-115326905-A | Preparation method and application of photoelectrochemical sensor | 广州大学 | 2022-11-11 | — | — | CN | claimed |
| CN-115096959-A | Unmarked photoelectric sensor for measuring content of lactic acid in human sweat | 广州大学 | 2022-09-23 | — | — | CN | claimed |
| CN-115326905-B | Preparation method and application of photoelectrochemical sensor | 广州大学 | 2025-01-03 | — | — | CN | disclosed |
| CN-115326905-B | Preparation method and application of photoelectrochemical sensor | 广州大学 | 2025-01-03 | — | — | CN | disclosed |
| CN-117720585-A | Pyrimidine dihydrazone tetranuclear Fe (II) complex containing quinoline structure and preparation method and application thereof | 河南中医药大学 | 2024-03-19 | — | — | CN | disclosed |
| CN-117700434-A | Tetranuclear node Zn (II) complex with anti-tumor activity and preparation method and application thereof | 河南中医药大学 | 2024-03-15 | — | — | CN | disclosed |
| CN-115096959-B | Non-mark photoelectric sensor for measuring lactic acid content in human sweat | 广州大学 | 2024-01-05 | — | — | CN | disclosed |
| CN-115096959-B | Non-mark photoelectric sensor for measuring lactic acid content in human sweat | 广州大学 | 2024-01-05 | — | — | CN | disclosed |
| CN-115326905-A | Preparation method and application of photoelectrochemical sensor | 广州大学 | 2022-11-11 | — | — | CN | disclosed |
| US-20100221506-A1 | RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING,INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100221506-A1 | RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING,INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100221507-A1 | RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100221507-A1 | RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100222472-A1 | WATER-BASED INK COMPOSITION FOR INKJET RECORDING | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| EP-2223978-A1 | Radiation-curable ink composition for inkjet recording, inkjet recording method, and printed matter | FUJIFILM Corporation (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-20100160504-A1 | WATER-BASED INK COMPOSITION FOR INKJET RECORDING | FUJIFILM CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100160504-A1 | WATER-BASED INK COMPOSITION FOR INKJET RECORDING | FUJIFILM CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |