SCHEMBL4076540

SCHEMBL4076540

NNc1cc(NN)ncn1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.42
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
ALDH1A1 P00352 2/20 0.33
GAA P10253 2/20 0.33
KDM4E B2RXH2 1/20 0.33
LMNA P02545 1/20 0.33
GOT1 P17174 1/20 0.33
MAPT P10636 1/20 0.33
EGFR P00533 1/20 0.33
CHEK1 O14757 2/20 0.33
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
DOT1L Q8TEK3 1/20 0.31
CDK1 P06493 1/20 0.31
CCNB1 P14635 1/20 0.31
CCNA2 P20248 1/20 0.31
CCNE1 P24864 1/20 0.31
CDK2 P24941 1/20 0.31
CDK5 Q00535 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2491280 0.82
SCHEMBL564890 0.82
SCHEMBL12143122 0.82
SCHEMBL9970901 0.82
Hydrochloric Acid SCHEMBL5574787 0.80 KMT2A (0.47) L3MBTL1MEN1KMT2AALDH1A1GAA
SCHEMBL10234017 0.78 JAK3 (0.34)
SCHEMBL9685860 0.77 CYP2C19 (0.50) L3MBTL1MEN1KMT2AALDH1A1GAA
SCHEMBL16622641 0.77
SCHEMBL15777833 0.77 CHEK1 (0.42) L3MBTL1ALDH1A1GAAKDM4ELMNA
SCHEMBL21767967 0.77 CA2 (0.55) ALDH1A1GAAKDM4EMAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115326905-B Preparation method and application of photoelectrochemical sensor 广州大学 2025-01-03 CN claimed
CN-117720585-A Pyrimidine dihydrazone tetranuclear Fe (II) complex containing quinoline structure and preparation method and application thereof 河南中医药大学 2024-03-19 CN claimed
CN-117700434-A Tetranuclear node Zn (II) complex with anti-tumor activity and preparation method and application thereof 河南中医药大学 2024-03-15 CN claimed
CN-115326905-A Preparation method and application of photoelectrochemical sensor 广州大学 2022-11-11 CN claimed
CN-115096959-A Unmarked photoelectric sensor for measuring content of lactic acid in human sweat 广州大学 2022-09-23 CN claimed
CN-115326905-B Preparation method and application of photoelectrochemical sensor 广州大学 2025-01-03 CN disclosed
CN-115326905-B Preparation method and application of photoelectrochemical sensor 广州大学 2025-01-03 CN disclosed
CN-117720585-A Pyrimidine dihydrazone tetranuclear Fe (II) complex containing quinoline structure and preparation method and application thereof 河南中医药大学 2024-03-19 CN disclosed
CN-117700434-A Tetranuclear node Zn (II) complex with anti-tumor activity and preparation method and application thereof 河南中医药大学 2024-03-15 CN disclosed
CN-115096959-B Non-mark photoelectric sensor for measuring lactic acid content in human sweat 广州大学 2024-01-05 CN disclosed
CN-115096959-B Non-mark photoelectric sensor for measuring lactic acid content in human sweat 广州大学 2024-01-05 CN disclosed
CN-115326905-A Preparation method and application of photoelectrochemical sensor 广州大学 2022-11-11 CN disclosed
US-20100221506-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING,INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 US disclosed
US-20100221506-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING,INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 US disclosed
US-20100221507-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 US disclosed
US-20100221507-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 US disclosed
US-20100222472-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-09-02 US disclosed
EP-2223978-A1 Radiation-curable ink composition for inkjet recording, inkjet recording method, and printed matter FUJIFILM Corporation (JP) 2010-09-01 EP disclosed
US-20100160504-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-06-24 US disclosed
US-20100160504-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-06-24 US disclosed