⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2828471 | 0.84 | — | — | |
| SCHEMBL4071748 | 0.81 | — | — | |
| SCHEMBL5180587 | 0.78 | NPC1 (0.31) | — | |
| SCHEMBL10382871 | 0.75 | — | — | |
| SCHEMBL649761 | 0.74 | — | — | |
| SCHEMBL4459369 | 0.70 | — | — | |
| SCHEMBL5616653 | 0.66 | ALDH1A1 (0.31) | — | |
| SCHEMBL466431 | 0.65 | NOS3 (0.31) | — | |
| SCHEMBL509622 | 0.63 | PTGS2 (0.32) | — | |
| SCHEMBL4925904 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4244286-B1 | POLYBUTYLENE TEREPHTHALATE COMPOSITION AND RADAR DEVICE COMPONENT THEREOF | BASF SE (DE) | 2024-07-10 | — | — | EP | claimed |
| EP-3778748-B1 | NONHALOGEN FLAME RETARDANT RESIN COMPOSITION AND FLAME RETARDANT RESIN MOLDED ARTICLE MANUFACTURED THEREFROM | LG CHEMICAL LTD (KR) | 2023-04-26 | — | — | EP | claimed |
| CN-114395241-A | Halogen-free high-gloss flame-retardant polystyrene material and preparation method and application thereof | 金发科技股份有限公司 | 2022-04-26 | — | — | CN | claimed |
| EP-3083832-B1 | POLYAMIDE MOULDING MATERIAL AND ITS APPLICATION | EMS PATENT AG (CH) | 2019-05-22 | — | — | EP | claimed |
| EP-1651718-B1 | FLAMEPROOF THERMOPLASTIC RESIN COMPOSITION | CHEIL IND INC (KR) | 2009-03-11 | — | — | EP | claimed |
| EP-1311612-B1 | REACTOR ALLOY OF SYNDIOTACTIC POLYSTYRENE HAVING HIGH IMPACT RESISTANCE | SAMSUNG ATOFINA CO LTD (KR) | 2007-02-28 | — | — | EP | claimed |
| EP-1060214-B1 | COMPOSITIONS CONTAINING A POLYARYLENE ETHER AND A DISPERSIBLE REACTIVE SOLVENT AND ARTICLES PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC (US) | 2003-07-23 | — | — | EP | claimed |
| EP-1060214-A1 | COMPOSITIONS CONTAINING A POLYARYLENE ETHER AND A DISPERSIBLE REACTIVE SOLVENT AND ARTICLES PREPARED THEREFROM | THE DOW CHEMICAL COMPANY (US) | 2000-12-20 | — | — | EP | claimed |
| US-6117943-A | THERMOPLASTIC POLYURETHANE MELT, | THE DOW CHEMICAL COMPANY (US) | 2000-09-12 | — | — | US | claimed |
| WO-1999045068-A1 | COMPOSITIONS CONTAINING A POLYARYLENE ETHER AND A DISPERSIBLE REACTIVE SOLVENT AND ARTICLES PREPARED THEREFROM | THE DOW CHEMICAL COMPANY (US) | 1999-09-10 | — | — | WO | claimed |
| EP-0199510-B1 | POLYPHENYLENE ETHER RESIN COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1990-09-12 | — | — | EP | claimed |
| US-20240124750-A1 | THERMALLY CURABLE HOT-MELT PRESSURE SENSITIVE ADHESIVE | BASF SE (DE) | 2024-04-18 | — | — | US | disclosed |
| US-11947257-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-04-02 | — | — | US | disclosed |
| US-11119408-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-14 | — | — | US | disclosed |
| WO-2021006192-A1 | THERMOPLASTIC RESIN COMPOSITION, MOLDED ARTICLE AND PRODUCT | 三菱電機株式会社 | 2021-01-14 | — | — | WO | disclosed |
| US-4885339-A | MOLDING MATERIALS | THE DOW CHEMICAL COMPANY (US) | 1989-12-05 | — | — | US | disclosed |
| US-4865745-A | REVERSE OSMOSIS ACROSS A MEMBRANE OF POLYETHYLENEIMINE CROSSLINKED WITH POLYISOCYANATE OR POLYCARBONYL CHLORIDE | TEXACO INC. (US) | 1989-09-12 | — | — | US | disclosed |
| US-4804712-A | LOW MELT VISCOSITY; HEAT RESISTANCE | THE DOW CHEMICAL COMPANY (US) | 1989-02-14 | — | — | US | disclosed |
| US-4783372-A | RADIATION SENSITIVE POLYIMIDES FOR PROTECTIVE COATINGS AND PHOTOGRAPHIC RELIEF IMAGES | CIBA-GEIGY CORPORATION (US) | 1988-11-08 | — | — | US | disclosed |
| US-4680195-A | POLYIMIDES WITH AROMATIC KETONE GROUPS, RELIEF IMAGES | CIBA-GEIGY CORPORATION (US) | 1987-07-14 | — | — | US | disclosed |