Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL919318 | 0.70 | — | — | |
| SCHEMBL4770343 | 0.65 | TSHR (0.38) | ALDH1A1 | |
| SCHEMBL15008471 | 0.64 | — | — | |
| Ethane SCHEMBL5833696 | 0.64 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL8516763 | 0.64 | — | — | |
| Methane SCHEMBL4884575 | 0.64 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL2804394 | 0.64 | TSHR (0.31) | ALDH1A1 | |
| Ethylene SCHEMBL5834104 | 0.62 | — | — | |
| SCHEMBL19926997 | 0.62 | — | — | |
| Cyclopentane SCHEMBL6063299 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | claimed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | claimed |
| JP-6228224-A | — | — | None | — | — | JP | disclosed |
| EP-3507104-B1 | PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU | BRIDGESTONE CORP (JP) | 2024-03-27 | — | — | EP | disclosed |
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | disclosed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | disclosed |
| CN-109641482-B | Preparation of cis-1, 4-polydienes having multiple silane functional groups prepared by in situ hydrosilylation of polymer glues | 株式会社普利司通 | 2021-11-05 | — | — | CN | disclosed |
| US-10975178-B2 | Production of cis-1,4-polydienes with multiple silane functional groups prepared by in-situ hydrosilylation of polymer cement | BRIDGESTONE CORPORATION (JP) | 2021-04-13 | — | — | US | disclosed |
| WO-2020209202-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM | 東ソー株式会社 | 2020-10-15 | — | — | WO | disclosed |
| US-20190211120-A1 | Production Of Cis-1,4-Polydienes With Multiple Silane Functional Groups Prepared By In-Situ Hydrosilylation Of Polymer Cement | BRIDGESTONE CORPORATION (JP) | 2019-07-11 | — | — | US | disclosed |
| EP-3507104-A1 | PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU | Bridgestone Corporation (JP) | 2019-07-10 | — | — | EP | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | disclosed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | disclosed |
| EP-0713153-B1 | Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner | CANON KK (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-6034025-A | Catalyst for polymerization and copolymerization of olefins | SAMSUNG GENERAL CHEMICALS, CO., LTD. (KR) | 2000-03-07 | — | — | US | disclosed |
| US-5824442-A | CONTROLLING DEVELOPMENT AND DEVELOPMENT FOR ELECTROSTATIC IMAGES WITH THIN FILMS | CANON KABUSHIKI KAISHA (JP) | 1998-10-20 | — | — | US | disclosed |
| US-5707770-A | TITANIA OR ALUMINA PARTICLES SURFACE TREATED WITH A SILICON COMPOUND OR SILICONE OIL, IMPROVED PERFORMANCE IN HIGH HUMIDITY | CANON KABUSHIKI KAISHA (JP) | 1998-01-13 | — | — | US | disclosed |
| EP-0713153-A2 | Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner | CANON KABUSHIKI KAISHA (JP) | 1996-05-22 | — | — | EP | disclosed |
| JP-H06228224-A | ELECTRON DONOR COMBINED WITH ZIEGLER-NATTA CATALYST FOR POLYDISPERSITY CONTROL OF POLYOLEFIN | FINA TECHNOL INC | 1994-08-16 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | VSIR, SMURF2, SMURF1 | ALDH1A1 4812/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.