SCHEMBL4089344

SCHEMBL4089344

CC=C(C)C(=O)OC1CC(C)(C)C(=O)O1

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.37
KDM4E B2RXH2 7/20 0.35
HPGD P15428 5/20 0.35
CYP3A4 P08684 2/20 0.35
HSD17B10 Q99714 2/20 0.35
ALDH1A1 P00352 7/20 0.33
MAPT P10636 2/20 0.33
LMNA P02545 2/20 0.33
HTT P42858 2/20 0.33
RCE1 Q9Y256 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MEN1 O00255 1/20 0.33
RECQL P46063 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
ABCB1 P08183 1/20 0.33
TP53 P04637 2/20 0.32
GAA P10253 1/20 0.32
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12121028 0.84 ALDH1A1 (0.33) KDM4EALDH1A1MAPTHTTRECQL
SCHEMBL12121027 0.77 OPRM1 (0.30)
SCHEMBL4089343 0.77 HTR7 (0.30)
SCHEMBL12121058 0.74 ALDH1A1 (0.38) ALDH1A1
SCHEMBL9511472 0.70 KDM4E (0.33) KMT2AKDM4EHPGDCYP3A4HSD17B10
SCHEMBL4093121 0.70 CA1 (0.38) KMT2AKDM4EHPGDCYP3A4HSD17B10
SCHEMBL3292263 0.70 KDM4E (0.33) KMT2AKDM4EHPGDCYP3A4HSD17B10
SCHEMBL3683016 0.69 MAPT (0.33) KMT2AKDM4EHPGDCYP3A4HSD17B10
SCHEMBL5699106 0.69 MAPT (0.33) KMT2AKDM4EHPGDCYP3A4HSD17B10
SCHEMBL27698046 0.69 ALDH1A1 (0.34) KDM4EHPGDCYP3A4HSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed