SCHEMBL4091653

SCHEMBL4091653

CC(C(=O)O)=C(C)C12CC3CC(O)(CC(CO)(C3)C1)C2

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
HSD11B1 P28845 1/20 0.32
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4098632 0.90 ALDH1A1 (0.40) ALDH1A1PKM
SCHEMBL4095697 0.85 HSD11B1 (0.35) ALDH1A1HSD11B1
SCHEMBL7735024 0.84 ALDH1A1 (0.37) ALDH1A1HSD11B1PKM
SCHEMBL4095010 0.83 MEN1 (0.38) ALDH1A1
SCHEMBL4095721 0.81 ALDH1A1 (0.37) ALDH1A1PKM
SCHEMBL4085666 0.80 ALDH1A1 (0.49) ALDH1A1HSD11B1PKM
SCHEMBL4092133 0.79 ALDH1A1 (0.33) ALDH1A1
SCHEMBL4098646 0.78 MEN1 (0.41) HSD11B1
SCHEMBL4084962 0.76 NPSR1 (0.34) ALDH1A1HSD11B1
SCHEMBL4102876 0.74 HSD11B1 (0.47) ALDH1A1HSD11B1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed