SCHEMBL4095010

SCHEMBL4095010

CC(C(=O)O)=C(C)C12CC3CC(C)(CC(CO)(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
GRIN2D O15399 1/20 0.36
GRIN3B O60391 1/20 0.36
GRIN1 Q05586 1/20 0.36
GRIN2A Q12879 1/20 0.36
GRIN2B Q13224 1/20 0.36
GRIN2C Q14957 1/20 0.36
GRIN3A Q8TCU5 1/20 0.36
MAPT P10636 1/20 0.36
ALDH1A1 P00352 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
GAA P10253 2/20 0.34
HTT P42858 2/20 0.34
NPC1 O15118 1/20 0.33
EPHX2 P34913 1/20 0.33
ALOX12 P18054 1/20 0.33
ALOX15 P16050 1/20 0.32
POLB P06746 1/20 0.32
P2RX7 Q99572 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4098632 0.90 ALDH1A1 (0.40) ALDH1A1GAA
SCHEMBL6228386 0.84 ALDH1A1 (0.43) MEN1KMT2AGRIN2DGRIN3BGRIN1
SCHEMBL4091653 0.83 ALDH1A1 (0.36) ALDH1A1
SCHEMBL4095721 0.81 ALDH1A1 (0.37) ALDH1A1
SCHEMBL4085666 0.80 ALDH1A1 (0.49) KMT2AALDH1A1GAAALOX15POLB
SCHEMBL4092702 0.79 PKM (0.33) SMN1; SMN2
SCHEMBL4093695 0.79 PKM (0.37) SMN1; SMN2
SCHEMBL4092133 0.79 ALDH1A1 (0.33) ALDH1A1
SCHEMBL4098646 0.78 MEN1 (0.41) MEN1KMT2AGRIN2DGRIN3BGRIN1
SCHEMBL4032638 0.77 MEN1 (0.40) MEN1KMT2AGRIN2DGRIN3BGRIN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed