SCHEMBL4095697

SCHEMBL4095697

CC(C(=O)O)=C(C)C12CC3CC(O)(CC(O)(C3)C1)C2

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.35
DPP4 P27487 2/20 0.31
ALDH1A1 P00352 2/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4098646 0.89 MEN1 (0.41) HSD11B1
SCHEMBL4084962 0.86 NPSR1 (0.34) HSD11B1ALDH1A1NPSR1
SCHEMBL4091653 0.85 ALDH1A1 (0.36) HSD11B1ALDH1A1
SCHEMBL4102876 0.84 HSD11B1 (0.47) HSD11B1ALDH1A1NPSR1
SCHEMBL4102904 0.84 PREP (0.34) DPP4
SCHEMBL6559746 0.79 HSD11B1 (0.40) HSD11B1DPP4ALDH1A1NPSR1
SCHEMBL964124 0.77 HSD11B1 (0.41) HSD11B1DPP4ALDH1A1
SCHEMBL4097842 0.76 GLA (0.37) ALDH1A1NPSR1
SCHEMBL5351544 0.75 HSD11B1 (0.40) HSD11B1DPP4ALDH1A1NPSR1
SCHEMBL524018 0.75 GLA (0.44) HSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed