SCHEMBL4092702

SCHEMBL4092702

CC(C(=O)O)=C(C)C12CC3(C)CC(CO)(CC(CO)(C3)C1)C2

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.31
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4093695 0.97 PKM (0.37) PKMSMN1; SMN2RAB9A
SCHEMBL4093641 0.90
SCHEMBL4095715 0.87 SMN1; SMN2 (0.35) SMN1; SMN2
SCHEMBL4096020 0.85
SCHEMBL4095010 0.79 MEN1 (0.38) SMN1; SMN2
SCHEMBL6229344 0.77 PKM (0.43) PKMSMN1; SMN2RAB9A
SCHEMBL4098632 0.75 ALDH1A1 (0.40) PKM
SCHEMBL4085537 0.74 PKM (0.41) PKMSMN1; SMN2RAB9A
SCHEMBL4095016 0.74 PKM (0.36) PKMSMN1; SMN2RAB9A
SCHEMBL5935937 0.73 CD81 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed