SCHEMBL4093119

SCHEMBL4093119

C=C(CC)C(=O)OC1CCC(=O)O1

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.35
CA9 Q16790 1/20 0.35
CYP1A2 P05177 2/20 0.34
PRKCA P17252 8/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75437 0.82 CA1 (0.38) CA1CA9CYP1A2PRKCA
SCHEMBL12124127 0.79 ALDH1A1 (0.36)
SCHEMBL4093121 0.76 CA1 (0.38) CA1CA9CYP1A2PRKCA
SCHEMBL6103713 0.75 CA1 (0.32) CA1CA9
SCHEMBL3292258 0.75
SCHEMBL5509448 0.75 ALDH1A1 (0.33)
SCHEMBL5304809 0.74 CA1 (0.43) CA1CA9CYP1A2PRKCA
SCHEMBL7747592 0.74 CA1 (0.43) CA1CA9CYP1A2PRKCA
SCHEMBL7568794 0.74 ALDH1A1 (0.39) CA1CA9CYP1A2PRKCA
SCHEMBL10159557 0.74 ALDH1A1 (0.39) CA1CA9PRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed