SCHEMBL75437

SCHEMBL75437

C=C(C)C(=O)OC1CCC(=O)O1

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.38
CA9 Q16790 1/20 0.38
ALDH1A1 P00352 2/20 0.35
GPX4 P36969 1/20 0.33
ATM Q13315 2/20 0.33
KDM4E B2RXH2 1/20 0.33
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.33
MAPT P10636 1/20 0.33
PKM P14618 1/20 0.33
HTT P42858 1/20 0.33
RECQL P46063 1/20 0.33
RAB9A P51151 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
KMT2A Q03164 1/20 0.33
PRKCA P17252 3/20 0.30
CYP1A2 P05177 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1897765 0.90 ALDH1A1 (0.33) CA1CA9ALDH1A1GPX4ATM
SCHEMBL10159557 0.84 ALDH1A1 (0.39) CA1CA9ALDH1A1ATMKMT2A
SCHEMBL12124127 0.83 ALDH1A1 (0.36) ALDH1A1POLBHTTTDP1
SCHEMBL4093121 0.83 CA1 (0.38) CA1CA9ALDH1A1KDM4ENPC1
SCHEMBL4093119 0.82 CA1 (0.35) CA1CA9PRKCACYP1A2
SCHEMBL10940067 0.82 GPX4 (0.36) ALDH1A1GPX4ATMKDM4ENPC1
SCHEMBL5304809 0.82 CA1 (0.43) CA1CA9POLBKMT2APRKCA
SCHEMBL7747592 0.82 CA1 (0.43) CA1CA9POLBKMT2APRKCA
SCHEMBL6103713 0.79 CA1 (0.32) CA1CA9
SCHEMBL5170309 0.76 CA1 (0.40) CA1CA9PRKCACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 853 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2289956-B1 Oil-repellent copolymer, method for producing the same and oil-repellent processing liquid ASAHI GLASS CO LTD (JP) 2012-08-22 EP claimed
EP-1154321-B1 Chemical amplification type positive resist compositions and sulfonium salts SUMITOMO CHEMICAL CO (JP) 2010-08-25 EP claimed
US-7220532-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-22 US claimed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US claimed
US-7160669-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-09 US claimed
US-7135268-B2 Using aromatic sulfonate compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-11-14 US claimed
US-7132218-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-11-07 US claimed
US-20060073411-A1 Chemically amplified resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-04-06 US claimed
US-7001706-B2 Sulfonate and a resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-02-21 US claimed
US-6951706-B2 Sulfonate and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-10-04 US claimed
US-6495306-B2 CONTAINING DIHYDROXY-1-ADAMANTYL (METH)ACRYLATE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-12-17 US claimed
WO-2002084402-A2 PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS CLARIANT INTERNATIONAL LTD (CH) 2002-10-24 WO claimed
US-6406830-B2 BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-06-18 US claimed
US-6348297-B1 COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-19 US claimed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US claimed
US-20020006582-A1 Chemical amplification type positive resist compositions and sulfonium salts SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US claimed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP claimed
EP-1154321-A1 Chemical amplification type positive resist compositions and sulfonium salts SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-14 EP claimed
US-20010014428-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-16 US claimed
EP-1041442-A1 Chemical amplification type positive resist SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-10-04 EP claimed