SCHEMBL4096667

SCHEMBL4096667

O=C1c2ccccc2SC2C=CC=CC12

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.37
MEN1 O00255 2/20 0.36
POLB P06746 2/20 0.36
KMT2A Q03164 2/20 0.36
S100A4 P26447 2/20 0.32
MAPT P10636 3/20 0.32
MAPK1 P28482 3/20 0.32
LMNA P02545 2/20 0.32
KDM4E B2RXH2 1/20 0.32
CES2 O00748 1/20 0.32
APAF1 O14727 1/20 0.32
TERT O14746 1/20 0.32
NPC1 O15118 1/20 0.32
PLIN1 O60240 1/20 0.32
TDP2 O95551 1/20 0.32
S1PR4 O95977 1/20 0.32
PLA2G1B P04054 1/20 0.32
BCHE P06276 1/20 0.32
PTPRC P08575 1/20 0.32
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13579137 0.76 MEN1 (0.32) MEN1POLBKMT2AMAPTMAPK1
SCHEMBL29689764 0.74 KMT2A (0.50) MEN1POLBKMT2AS100A4MAPT
SCHEMBL278741 0.74 KMT2A (0.50) MEN1POLBKMT2AS100A4MAPT
SCHEMBL12957241 0.73
SCHEMBL10042166 0.73 SMN1; SMN2 (0.37) MAPTMAPK1LMNANPC1RAB9A
SCHEMBL24741705 0.73 MAPT (0.31) MEN1POLBKMT2AMAPTMAPK1
SCHEMBL5019860 0.73 HDAC4 (0.30)
SCHEMBL452910 0.73 ALOX5 (0.34) ALOX5MAOA
SCHEMBL28647609 0.72 ALOX5 (0.32) ALOX5POLBKMT2AMAPTHTT
SCHEMBL24741704 0.71 NFKB1 (0.40) S100A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230265231-A1 IMIDE-LINKED POLYMERIC PHOTOINITIATORS ARKEMA FRANCE (FR) 2023-08-24 US disclosed
US-20230265231-A1 IMIDE-LINKED POLYMERIC PHOTOINITIATORS ARKEMA FRANCE (FR) 2023-08-24 US disclosed
US-9963545-B2 Processes for enhancing flame retardance and chemical resistance of polymers SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2018-05-08 US disclosed
US-9963545-B2 Processes for enhancing flame retardance and chemical resistance of polymers SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2018-05-08 US disclosed
EP-2076563-B1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS BASF SE (DE) 2016-08-17 EP disclosed
US-20150218309-A1 PROCESSES FOR ENHANCING FLAME RETARDANCE AND CHEMICAL RESISTANCE OF POLYMERS SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2015-08-06 US disclosed
US-8808961-B2 Composition, resist film, pattern forming method, and inkjet recording method FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
US-8808961-B2 Composition, resist film, pattern forming method, and inkjet recording method FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
US-8501053-B2 Multi color, photoactive, color changing compositions and UV dosimeters BASF SE (DE) 2013-08-06 US disclosed
US-8501053-B2 Multi color, photoactive, color changing compositions and UV dosimeters BASF SE (DE) 2013-08-06 US disclosed
EP-1688467-B1 Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate FUJIFILM CORP (JP) 2008-06-25 EP disclosed
WO-2008049743-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA HOLDING INC. (CH) 2008-05-02 WO disclosed
US-20080075883-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed
US-20080075883-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed
EP-1826206-A1 Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate Fujifilm Corporation (JP) 2007-08-29 EP disclosed
US-20070197677-A1 Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-08-23 US disclosed
US-20070197677-A1 Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-08-23 US disclosed
EP-1808466-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate Fujifilm Corporation (JP) 2007-07-18 EP disclosed
US-20070160815-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-07-12 US disclosed
US-20070160815-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070197677-A1 Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate SPIN2B, KAT2B, TIPRL ALOX5 4163/4885MEN1 3951/4885POLB 1961/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.