SCHEMBL4097831

SCHEMBL4097831

CC=C(C)C(=O)OC1OC(=O)CC1(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.38
HPGD P15428 5/20 0.38
CYP3A4 P08684 2/20 0.38
HSD17B10 Q99714 2/20 0.38
KMT2A Q03164 2/20 0.34
ALDH1A1 P00352 7/20 0.33
HTT P42858 3/20 0.33
LMNA P02545 2/20 0.33
MAPT P10636 2/20 0.33
RCE1 Q9Y256 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MEN1 O00255 1/20 0.33
RECQL P46063 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
ABCB1 P08183 1/20 0.33
TP53 P04637 2/20 0.32
GAA P10253 1/20 0.32
POLB P06746 1/20 0.32
KDR P35968 1/20 0.32
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12121029 0.77 OPRM1 (0.30)
SCHEMBL12121052 0.73 ALDH1A1 (0.37) ALDH1A1
SCHEMBL12199601 0.71 SMN1; SMN2 (0.31) ALDH1A1SMN1; SMN2
SCHEMBL12121051 0.70 TSHR (0.34) HPGD
SCHEMBL701380 0.69 ALDH1A1 (0.32) ALDH1A1MAPTNPSR1GAA
SCHEMBL4089344 0.68 KMT2A (0.37) KDM4EHPGDCYP3A4HSD17B10KMT2A
SCHEMBL3870701 0.67 APEX1 (0.33) ALDH1A1
SCHEMBL4093121 0.67 CA1 (0.38) KDM4EHPGDCYP3A4HSD17B10KMT2A
SCHEMBL9511472 0.63 KDM4E (0.33) KDM4EHPGDCYP3A4HSD17B10KMT2A
SCHEMBL24840437 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed