SCHEMBL4101066

SCHEMBL4101066

CC=CCc1ccc(C(C)=O)cc1

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.57
LMNA P02545 2/20 0.50
HSD17B10 Q99714 1/20 0.50
NOS3 P29474 2/20 0.42
NOS1 P29475 2/20 0.42
MAOB P27338 4/20 0.42
PYCR1 P32322 1/20 0.42
HPGD P15428 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
MAPT P10636 2/20 0.42
RAB9A P51151 1/20 0.42
TSHR P16473 1/20 0.41
MAOA P21397 1/20 0.41
HSD17B1 P14061 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
EPHX2 P34913 1/20 0.40
NR1H4 Q96RI1 1/20 0.40
GAA P10253 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28976969 0.84 ALDH1A1 (0.55) KMT2AL3MBTL1MAPTRAB9ATSHR
SCHEMBL1260786 0.81 KMT2A (0.64) KMT2ALMNAHSD17B10NOS3NOS1
SCHEMBL27926571 0.81 KMT2A (0.53) KMT2ALMNAHSD17B10MAOBL3MBTL1
SCHEMBL27908596 0.81 KMT2A (0.53) KMT2ALMNAHSD17B10MAOBL3MBTL1
SCHEMBL17892895 0.80 AKR1C4 (0.35) KMT2AHSD17B10MAOBTSHRSMN1; SMN2
SCHEMBL8336980 0.79 PLK1 (0.59) HPGDTSHRSMN1; SMN2EPHX2NR1H4
SCHEMBL9133770 0.79 LOXL2 (0.62) KMT2AHSD17B10HPGDMAPTRAB9A
SCHEMBL195563 0.78 KMT2A (0.59) KMT2ALMNAHSD17B10MAOBPYCR1
SCHEMBL11047626 0.78 KMT2A (0.59) KMT2ALMNAHSD17B10MAOBPYCR1
SCHEMBL28879800 0.78 KMT2A (0.59) KMT2ALMNAHSD17B10MAOBPYCR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8703395-B2 Pattern-forming method JSR CORPORATION (JP) 2014-04-22 US disclosed
US-20130107235-A1 PATTERN-FORMING METHOD JSR CORPORATION (JP) 2013-05-02 US disclosed
WO-2013061601-A1 PATTERN-FORMING METHOD JSR CORPORATION (JP) 2013-05-02 WO disclosed
US-20090209705-A1 THERMOPLASTIC RESIN COMPOSITION, OPTICAL FILM AND RETARDATION FILM JSR CORPORATION (JP) 2009-08-20 US disclosed
EP-1795559-A1 THERMOPLASTIC RESIN COMPOSITION, OPTICAL FILM AND RETARDATION FILM JSR Corporation (JP) 2007-06-13 EP disclosed
US-5466838-A Catalytic reaction of olefin with oxygen in the presence of aldehyde SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-11-14 US disclosed
EP-0540009-B1 Process for producing epoxides SUMITOMO CHEMICAL CO (JP) 1995-08-30 EP disclosed
US-5367087-A Process for producing epoxide SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-11-22 US disclosed
EP-0540009-A1 Process for producing epoxides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-05-05 EP disclosed