SCHEMBL4122409

SCHEMBL4122409

C=C(C)C(=O)OC(=O)C=Cc1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.55
TDP1 Q9NUW8 1/20 0.55
KMT2A Q03164 4/20 0.53
LMNA P02545 4/20 0.49
MAPT P10636 7/20 0.48
ALDH1A1 P00352 5/20 0.48
HDAC3 O15379 2/20 0.48
HDAC4 P56524 2/20 0.48
HDAC1 Q13547 2/20 0.48
HDAC2 Q92769 2/20 0.48
HDAC8 Q9BY41 2/20 0.48
HDAC6 Q9UBN7 2/20 0.48
PLIN1 O60240 2/20 0.48
RECQL P46063 2/20 0.48
PLIN5 Q00G26 2/20 0.48
ABHD5 Q8WTS1 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
TNKS O95271 1/20 0.48
HCAR2 Q8TDS4 1/20 0.48
HDAC7 Q8WUI4 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10760753 1.00 GLA (0.55) GLATDP1KMT2ALMNAMAPT
SCHEMBL14226873 0.86 GLA (0.58) GLATDP1KMT2ALMNAMAPT
SCHEMBL1736406 0.86 GLA (0.58) GLATDP1KMT2ALMNAMAPT
SCHEMBL1736407 0.86 GLA (0.58) GLATDP1KMT2ALMNAMAPT
SCHEMBL29198288 0.86 MAPT (0.59) GLATDP1KMT2ALMNAMAPT
Styrene SCHEMBL9719745 0.85 ALDH1A1 (0.45) GLATDP1KMT2ALMNAMAPT
Styrene SCHEMBL3149158 0.85 ALDH1A1 (0.45) GLATDP1KMT2ALMNAMAPT
SCHEMBL23389869 0.85 CA12 (0.60) KMT2ALMNAMAPTALDH1A1SMN1; SMN2
SCHEMBL29935969 0.85 GLA (0.46) GLATDP1KMT2ALMNAMAPT
SCHEMBL28613781 0.84 LMNA (0.50) GLATDP1KMT2ALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101045759-B Styrene or substituted styrene polymer type quaternary ammonium salt antistat or bacterial agent and preparation method thereof DINGLAN GREEN CHEMICAL INST CO LTD CHANGZHOU 2011-06-01 CN claimed
CN-101045759-A Styrene or substituted styrene polymer type quaternary ammonium salt antistat or bacterial agent and preparation method thereof DINGLAN GREEN CHEMICAL INST CO (CN) 2007-10-03 CN claimed
US-4687727-A Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1987-08-18 US claimed
CN-106066504-B Wire grid polarizing plate and display device including the same 三星显示有限公司 2020-08-28 CN disclosed
US-8967781-B2 Image recording composition, image recording ink set and recording apparatus FUJI XEROX CO., LTD. (JP) 2015-03-03 US disclosed
US-20130095254-A1 IMAGE-RECORDING COMPOSITION, IMAGE-RECORDING APPARATUS, AND IMAGE-RECORDING METHOD FUJI XEROX CO., LTD. (JP) 2013-04-18 US disclosed
US-8342672-B2 Recording apparatus FUJI XEROX CO., LTD. (JP) 2013-01-01 US disclosed
US-8246158-B2 Image recording composition, image recording ink set and recording apparatus FUJI XEROX CO., LTD. (JP) 2012-08-21 US disclosed
CN-101045759-B Styrene or substituted styrene polymer type quaternary ammonium salt antistat or bacterial agent and preparation method thereof DINGLAN GREEN CHEMICAL INST CO LTD CHANGZHOU 2011-06-01 CN disclosed
CN-1853611-B Cosmetic compositions comprising polymer particle dispersion and cosmetic process using it OREAL 2010-06-16 CN disclosed
US-20090318591-A1 IMAGE RECORDING COMPOSITION, IMAGE RECORDING INK SET AND RECORDING APPARATUS FUJI XEROX CO., LTD. (JP) 2009-12-24 US disclosed
US-20090318613-A1 IMAGE RECORDING COMPOSITION, IMAGE RECORDING INK SET AND RECORDING APPARATUS FUJI XEROX CO., LTD. (JP) 2009-12-24 US disclosed
US-20090237479-A1 RECORDING APPARATUS FUJI XEROX CO., LTD. (JP) 2009-09-24 US disclosed
CN-101045759-A Styrene or substituted styrene polymer type quaternary ammonium salt antistat or bacterial agent and preparation method thereof DINGLAN GREEN CHEMICAL INST CO (CN) 2007-10-03 CN disclosed
CN-1853611-A Polymer particle dispersion, cosmetic compositions comprising it and cosmetic process using it OREAL (FR) 2006-11-01 CN disclosed
US-5491244-A Acrylate ester HOWARD UNIVERSITY (US) 1996-02-13 US disclosed
WO-1995032940-A1 PROCESS FOR THE PRODUCTION OF OLEFIN ACID ANHYDRIDES AND ESTERS THEREOF HOWARD UNIVERSITY (US) 1995-12-07 WO disclosed