SCHEMBL4134559

SCHEMBL4134559

CO[Si](CCCNCCNCCc1ccccc1)(OC)OC

nearest known ligand 0.58

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 9/20 0.58
MEN1 O00255 1/20 0.51
KMT2A Q03164 1/20 0.51
HTR2A P28223 2/20 0.47
SLC2A1 P11166 1/20 0.47
GAA P10253 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18419397 0.98 SIGMAR1 (0.59) SIGMAR1MEN1KMT2AHTR2ASLC2A1
SCHEMBL8079615 0.95 SIGMAR1 (0.59) SIGMAR1MEN1KMT2AHTR2ASLC2A1
SCHEMBL28980113 0.92 SIGMAR1 (0.63) SIGMAR1HTR2A
SCHEMBL22472342 0.90 SIGMAR1 (0.53) SIGMAR1MEN1KMT2AHTR2ASLC2A1
SCHEMBL144038 0.87 CHRM2 (0.58) SIGMAR1MEN1KMT2AGAA
Hydrochloric Acid SCHEMBL919007 0.86 CHRM2 (0.56) SIGMAR1MEN1KMT2AGAA
SCHEMBL5160242 0.86 SIGMAR1 (0.56) SIGMAR1MEN1KMT2AGAA
SCHEMBL4134564 0.84 SIGMAR1 (0.57) SIGMAR1MEN1KMT2AGAA
SCHEMBL48855 0.83 MAOA (0.58) SIGMAR1MEN1KMT2AGAA
SCHEMBL21271612 0.83 SIGMAR1 (0.58) SIGMAR1MEN1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1418021-B1 Polishing pad JSR CORP (JP) 2009-01-21 EP disclosed
EP-1348747-B1 Gas barrier coating composition and method for manufacturing same JSR CORP (JP) 2007-02-14 EP disclosed
EP-1106661-B1 Coating composition and hardened film obtained therefrom JSR CORP (JP) 2006-03-08 EP disclosed
US-6992123-B2 Polishing pad JSR CORPORATION (JP) 2006-01-31 US disclosed
US-20040118051-A1 Polishing pad JSR CORPORATION (JP) 2004-06-24 US disclosed
EP-1418021-A1 Polishing pad JSR Corporation (JP) 2004-05-12 EP disclosed
US-6660394-B1 Siloxane-vinyl copolymer, oxazoline crosslinker and organo-metallic betaketone or multifunctional hydrazine; rapid low temperature curing; water, weather, chemical, acid, alkali and wear resistance; durable adhesion JSR CORPORATION (JP) 2003-12-09 US disclosed
US-20030187113-A1 Gas barrier coating composition and method for manufacturing same JSR CORPORATION (JP) 2003-10-02 US disclosed
EP-1348747-A1 Gas barrier coating composition and method for manufacturing same JSR Corporation (JP) 2003-10-01 EP disclosed
EP-1106661-A2 Coating composition and hardened film obtained therefrom JSR Corporation (JP) 2001-06-13 EP disclosed