SCHEMBL4134564

SCHEMBL4134564

CCO[Si](CCCNCCNCCc1ccccc1)(OCC)OCC

nearest known ligand 0.57

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 9/20 0.57
GAA P10253 1/20 0.44
KMT2A Q03164 2/20 0.43
SLC6A2 P23975 1/20 0.43
SLC6A4 P31645 1/20 0.43
SLC6A3 Q01959 1/20 0.43
DRD2 P14416 1/20 0.43
DRD4 P21917 1/20 0.43
DRD3 P35462 1/20 0.43
MEN1 O00255 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21271612 0.98 SIGMAR1 (0.58) SIGMAR1GAAKMT2ASLC6A2SLC6A4
SCHEMBL22472342 0.93 SIGMAR1 (0.53) SIGMAR1GAAKMT2AMEN1
SCHEMBL29008266 0.92 SIGMAR1 (0.59) SIGMAR1DRD2DRD4DRD3
SCHEMBL4135709 0.88 CHRM2 (0.54) SIGMAR1GAAKMT2ADRD4MEN1
SCHEMBL136399 0.84 MAOA (0.55) SIGMAR1GAAKMT2ADRD4MEN1
SCHEMBL4134559 0.84 SIGMAR1 (0.58) SIGMAR1GAAKMT2AMEN1
SCHEMBL9761086 0.84 CHRM2 (0.62) SIGMAR1KMT2AMEN1
Phenethylamine SCHEMBL5683117 0.83 HTR2A (0.43) SIGMAR1
SCHEMBL18419397 0.83 SIGMAR1 (0.59) SIGMAR1GAAKMT2ADRD2DRD4
SCHEMBL15387165 0.82 CHRM2 (0.44) SIGMAR1KMT2ASLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1418021-B1 Polishing pad JSR CORP (JP) 2009-01-21 EP disclosed
EP-1348747-B1 Gas barrier coating composition and method for manufacturing same JSR CORP (JP) 2007-02-14 EP disclosed
EP-1106661-B1 Coating composition and hardened film obtained therefrom JSR CORP (JP) 2006-03-08 EP disclosed
US-6992123-B2 Polishing pad JSR CORPORATION (JP) 2006-01-31 US disclosed
US-20040118051-A1 Polishing pad JSR CORPORATION (JP) 2004-06-24 US disclosed
EP-1418021-A1 Polishing pad JSR Corporation (JP) 2004-05-12 EP disclosed
US-6660394-B1 Siloxane-vinyl copolymer, oxazoline crosslinker and organo-metallic betaketone or multifunctional hydrazine; rapid low temperature curing; water, weather, chemical, acid, alkali and wear resistance; durable adhesion JSR CORPORATION (JP) 2003-12-09 US disclosed
US-20030187113-A1 Gas barrier coating composition and method for manufacturing same JSR CORPORATION (JP) 2003-10-02 US disclosed
EP-1348747-A1 Gas barrier coating composition and method for manufacturing same JSR Corporation (JP) 2003-10-01 EP disclosed
EP-1106661-A2 Coating composition and hardened film obtained therefrom JSR Corporation (JP) 2001-06-13 EP disclosed