SCHEMBL4137823

SCHEMBL4137823

c1cc2cc3ncsc3cc2[nH]1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 1/20 0.41
DYRK1A Q13627 1/20 0.39
ALDH1A1 P00352 1/20 0.38
HSD17B10 Q99714 1/20 0.38
KDM4E B2RXH2 1/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
HKDC1 Q2TB90 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CSNK2A1 P68400 1/20 0.37
IMPDH2 P12268 1/20 0.37
IMPDH1 P20839 1/20 0.37
AHR P35869 6/20 0.36
NR4A2 P43354 2/20 0.36
CYP2A6 P11509 1/20 0.36
CMA1 P23946 1/20 0.36
F7 P08709 1/20 0.36
LTA4H P09960 1/20 0.36
F3 P13726 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4143115 0.93 GPR84 (0.41) GPR84DYRK1AALDH1A1HSD17B10KDM4E
SCHEMBL13394547 0.79 NPC1 (0.50) DYRK1ANPC1TGFBR1
SCHEMBL23747262 0.76 DYRK1A (0.48) DYRK1AKDM4ENPC1RAB9AHKDC1
SCHEMBL10917620 0.75 MAPK1 (0.44) DYRK1AALDH1A1HSD17B10KDM4ENPC1
Indole SCHEMBL1647849 0.71 ALDH1A1 (0.61) DYRK1AALDH1A1HSD17B10KDM4ENPC1
SCHEMBL1156175 0.71 ALDH1A1 (0.56) DYRK1AALDH1A1HSD17B10KDM4ENPC1
SCHEMBL11444870 0.71 GPR84 (0.48) GPR84CSNK2A1IMPDH2IMPDH1AHR
SCHEMBL4296143 0.71 ALDH1A1 (0.52) DYRK1AALDH1A1HSD17B10KDM4ENPC1
SCHEMBL4560336 0.69 ALDH1A1 (0.50) DYRK1AALDH1A1HSD17B10KDM4ENPC1
SCHEMBL2530865 0.68 GPR84 (0.67) GPR84ALDH1A1HSD17B10KDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 WO disclosed
EP-1061411-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-10-11 EP disclosed
EP-1067430-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-09-13 EP disclosed
US-20050271987-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2005-12-08 US disclosed
US-6838231-B2 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2005-01-04 US disclosed
US-20040166450-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2004-08-26 US disclosed
US-6780577-B2 A MULTILAYER COMPRISING PHOTOSENSITIVE DYES WITH ABSORPTION SPECTRA AT A HIGH FLUORESCENCE WAVELENGTH FUJI PHOTO FILM CO., LTD. (JP) 2004-08-24 US disclosed
US-6730468-B1 ADSORBED ON SURFACE A SENSITIZING DYE IN MULTIPLE LAYERS FUJI PHOTO FILM CO., LTD. (JP) 2004-05-04 US disclosed
US-6692905-B2 COLOR PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 2004-02-17 US disclosed
US-20030180673-A1 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. 2003-09-25 US disclosed
US-20030170575-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. 2003-09-11 US disclosed
US-6610466-B2 Exhibits increased light absorption and light absorption intensity and which has sensitizing dyes adsorbed in multilayer form stably even in the presence of an organic solvent. FUJI PHOTO FILM CO., LTD. (JP) 2003-08-26 US disclosed
US-6582894-B1 Silver haide photographic emulsion and photographic light-sensitive material using same FUJI PHOTO FILM CO., LTD. (JP) 2003-06-24 US disclosed
US-6521401-B1 Spectrally sensitizing with dye that does not have electric charge or forms an inner salt FUJI PHOTO FILM CO., LTD. (JP) 2003-02-18 US disclosed
US-20020177087-A1 Silver halide photographic lightsensitive material FUJIFILM CORPORATION (JP) 2002-11-28 US disclosed
US-6465166-B1 HIGH SPEED SILVER HALIDE PHOTOGRAPHIC EMULSION WHEREIN THE GRAIN AGGLOMERATION IS PREVENTED AND PHOTOGRAPHIC MATERIAL REDUCED IN RESIDUAL DYE COLOR AFTER PROCESSING FUJI PHOTO FILM. CO., LTD. (JP) 2002-10-15 US disclosed
US-20020012892-A1 Methine compound-containing silver halide photographic emulsion and photographic material using the same FUJIFILM CORPORATION (JP) 2002-01-31 US disclosed
EP-1067430-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2001-01-10 EP disclosed
EP-1061411-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-20 EP disclosed